Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Michael W. Rhodes"'
Autor:
Chitrlada Thongbai, Noppadon Khangrang, Watchara Jaikla, Pitchayapak Kitisri, Kalayaporn Kongmali, Michael W. Rhodes, Sakhorn Rimjaem, Jatuporn Saisut, Supasin Sukara, Sikharin Suphakul
Publikováno v:
physica status solidi (a). 220
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e75ba4d4e71b73beb92b48a47809470
https://doi.org/10.1002/pssa.202200398
https://doi.org/10.1002/pssa.202200398
Autor:
R. Suwankosum, S. Singkarat, L.D. Yu, Udomrat Tippawan, Michael W. Rhodes, S. Intarasiri, D. Bootkul, S. Rattanarin, D. Suwannakachorn, J. Techarung, B. Phanchaisri, A. Wijaikhum
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 365:414-418
In our efforts in developing ion beam technology for novel applications in biology and gemmology, an economic simple compact ion implanter especially for the purpose was constructed. The designing of the machine was aimed at providing our users with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a927e3ce019ed1e0a0d5683f97ccae7
https://doi.org/10.1016/j.nimb.2015.07.066
https://doi.org/10.1016/j.nimb.2015.07.066
Autor:
Kanda Singkarat, S. Singkarat, Harry J. Whitlow, Nirut Pussadee, Nitipon Puttaraksa, Somrit Unai, Michael W. Rhodes
Publikováno v:
Microelectronic Engineering. 102:18-21
For soft lithography, the conventional negative tone resists, such as SU-8, that are used to create the mold have a number of drawbacks. PMMA, which is normally used as a positive tone resist, can be used as a negative resist by using high-fluence ir
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5eb3a48469560aaee8df41892193174b
https://doi.org/10.1016/j.mee.2012.05.010
https://doi.org/10.1016/j.mee.2012.05.010
Autor:
S. Singkarat, Nitipon Puttaraksa, Kanda Singkarat, Somrit Unai, Harry J. Whitlow, Michael W. Rhodes
Publikováno v:
Nuclear Instruments and Methods in Physics Research B. 272:149
In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8988963e4bc5a092ec3f1a705f0efed4
http://juuli.fi/Record/0246624912
http://juuli.fi/Record/0246624912