Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Michael W Phaneuf"'
Autor:
Alyssa Williams, Maria Davola, Karen Mossman, Kathryn Grandfield, Michael W Phaneuf, Nabil Bassim
Publikováno v:
Microscopy and Microanalysis. 28:1528-1530
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9b4aaec4a405bee9ab39d1d23e408d3
https://doi.org/10.1017/s1431927622006146
https://doi.org/10.1017/s1431927622006146
Publikováno v:
Microscopy and Microanalysis. 28:272-274
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a42e8fd40eae7482df6555a3624770d
https://doi.org/10.1017/s1431927622001891
https://doi.org/10.1017/s1431927622001891
Autor:
Thomas Rodgers, Allen Gu, Greg Johnson, Masako Terada, Nathaniel Cohan, Vignesh Viswanathan, Michael W. Phaneuf, Joachim de Fourestier, Ethan Ruttan, Stewart McCracken, Suzanne Costello, Aidan M Robinson, Andrew Gibson, Alan Balfour
Publikováno v:
International Symposium for Testing and Failure Analysis.
Microscopic imaging and characterization of semiconductor devices and material properties often begin with a sample preparation step. A variety of sample preparation methods such as mechanical lapping and broad ion beam (BIB) milling have been widely
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::246ad1832d1e1a2111d958a60c06d720
https://doi.org/10.31399/asm.cp.istfa2022p0319
https://doi.org/10.31399/asm.cp.istfa2022p0319
Autor:
John A. Notte, Tobias Volkenandt, Alexandre Laquerre, Michael W. Phaneuf, Fabian Perez-Willard, Raymond Hill
Publikováno v:
Applications of Microscopy in Materials and Life Sciences ISBN: 9789811629815
In this paper, we review selected recent innovations to focused ion beam (FIB) instrumentation. Three examples show how new inventions and refinement of existing workflows continue to expand the large application space already covered today by FIB, F
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::931fd966920b3fabb2feb2051e42f197
https://doi.org/10.1007/978-981-16-2982-2_18
https://doi.org/10.1007/978-981-16-2982-2_18
Publikováno v:
Microscopy and Microanalysis. 26:1374-1375
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::420d8bdccfbbfb437f46c3b181d2d70f
https://doi.org/10.1017/s1431927620017882
https://doi.org/10.1017/s1431927620017882
Autor:
Andy Smith, Jonathan Gerald England, Alexandre Laquerre, Russell M. Gwilliam, Michael W. Phaneuf
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 272:409-413
We have investigated ion beam assisted crystallization as a possible method for the creation of crystalline Si layers on amorphous substrates. Ion beam assisted crystallization has previously been characterised with pulsed and modest continuous beam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e87c75d7dc5498ec2cc43d24124eaef
https://doi.org/10.1016/j.nimb.2011.01.111
https://doi.org/10.1016/j.nimb.2011.01.111
Autor:
Jeff Gelb, Michael W. Phaneuf, Fabian Perez-Willard, Lorenz Lechner, Andy Steinbach, Arno Merkle, David Unrau
Publikováno v:
Microscopy and Microanalysis. 21:15-16
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::297cbde185f722a6308e63d8c9b83ec7
https://doi.org/10.1017/s1431927615000872
https://doi.org/10.1017/s1431927615000872
Autor:
Alexandre Laquerre, Dirk Schumann, Hojatollah Vali, Sebastian Fuchs, David Mayer, Neil R. Banerjee, Michael W. Phaneuf, J. Stromberg
Publikováno v:
Microscopy and Microanalysis. 20:1008-1009
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfa1b98debc65d98e065435155b64cf1
https://doi.org/10.1017/s143192761400676x
https://doi.org/10.1017/s143192761400676x
Publikováno v:
International Symposium for Testing and Failure Analysis.
As semiconductor device features continue to decrease in size from merely sub micron to below 100 nanometers it becomes necessary to mill smaller and higher aspect ratio FIB vias with reduced ion beam current. This significantly reduces the number of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e324ddc6ecfe20146a848a01304ed74
https://doi.org/10.31399/asm.cp.istfa2004p0151
https://doi.org/10.31399/asm.cp.istfa2004p0151
Publikováno v:
Pacific International Conference on Applications of Lasers and Optics.
Laser processing of glass components is of significant commercial interest for the optoelectronics and telecommunications industries. In this paper, we present laser processing techniques using microsecond, nanosecond, and femtosecond lasers for mach
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41f5476ff9cc5ab786f3b8fd4781a043
https://doi.org/10.2351/1.5056140
https://doi.org/10.2351/1.5056140