Zobrazeno 1 - 10
of 48
pro vyhledávání: '"Michael Tanksalvala"'
Autor:
Giulia F. Mancini, Karl Robert, Elisabeth Shanblatt, Charles Bevis, Dennis Gardner, Michael Tanksalvala, Jennifer Russell, Daniel Adams, Henry Kapteyn, John Badding, Thomas Mallouk, Margaret Murnane
Publikováno v:
EPJ Web of Conferences, Vol 205, p 05015 (2019)
We demonstrate full-field quantitative ptychographic imaging using tabletop high harmonics to visualize the extended structure of silica close-packed nanosphere multilayers with
Externí odkaz:
https://doaj.org/article/f0e834b39003443b9dcbff7455330cf1
Autor:
Yuka Esashi, Nicholas W. Jenkins, Michael Tanksalvala, Yunzhe Shao, Brendan McBennett, Joshua L. Knobloch, Henry C. Kapteyn, Margaret M. Murnane
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1b3907efca6b81b6454d7bf71471f18
https://doi.org/10.1117/12.2658543
https://doi.org/10.1117/12.2658543
Autor:
Bin Wang, Nathan Brooks, Michael Tanksalvala, Yuka Esashi, Nicolas Jenkins, Peter Johnsen, Iona Binnie, Guan Gui, Yunzhe Shao, Margaret Murnane, Henry Kapteyn
Publikováno v:
Photomask Technology 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e344a4a6d8dce1003138ea30b4469b6a
https://doi.org/10.1117/12.2641726
https://doi.org/10.1117/12.2641726
Autor:
Nathan J. Brooks, Bin Wang, Iona Binnie, Michael Tanksalvala, Yuka Esashi, Joshua L. Knobloch, Quynh L. D. Nguyen, Brendan McBennett, Nicholas W. Jenkins, Guan Gui, Zhe Zhang, Henry C. Kapteyn, Margaret M. Murnane, Charles S. Bevis
Publikováno v:
Optics express. 30(17)
We demonstrate temporally multiplexed multibeam ptychography implemented for the first time in the EUV, by using a high harmonic based light source. This allows for simultaneous imaging of different sample areas, or of the same area at different time
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a1d198481d99abba56632fd843a91829
https://pubmed.ncbi.nlm.nih.gov/36242139
https://pubmed.ncbi.nlm.nih.gov/36242139
Autor:
Matthew N. Jacobs, Yuka Esashi, Nicholas W. Jenkins, Nathan J. Brooks, Henry C. Kapteyn, Margaret M. Murnane, Michael Tanksalvala
Publikováno v:
Optics express. 30(15)
Recent advances in structured illumination are enabling a wide range of applications from imaging to metrology, which can benefit from advanced beam characterization techniques. Solving uniquely for the spatial distribution of polarization in a beam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a003e7591d8003b5df753141fbc045d7
https://pubmed.ncbi.nlm.nih.gov/36236954
https://pubmed.ncbi.nlm.nih.gov/36236954
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d4b902090bb2968b1c07a2fc15716cd
https://doi.org/10.1117/12.2612098
https://doi.org/10.1117/12.2612098
Autor:
Nathan J. Brooks, Bin Wang, Charles Bevis, Iona Binnie, Michael Tanksalvala, Yuka Esashi, Joshua L. Knobloch, Henry C. Kapteyn, Margaret M. Murnane
Publikováno v:
Conference on Lasers and Electro-Optics.
Multiple beam ptychographic imaging with an extreme ultraviolet high harmonic light source is demonstrated through simultaneous spectral and temporal multiplexing. This method is experimentally straightforward to implement and ideal for hyperspectral
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f466ce5984164ba9745a2a922bb88648
https://doi.org/10.1364/cleo_si.2022.sth2e.3
https://doi.org/10.1364/cleo_si.2022.sth2e.3
Autor:
Chen-Ting Liao, Henry C. Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Bin Wang, Nicholas W. Jenkins, Zhe Zhang
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
Coherent Fourier scatterometry (CFS) via laser beams with a Gaussian spatial profile is routinely used as an in-line inspection tool to detect defects on, for example, lithographic substrates, masks, reticles, and wafers. New metrology techniques tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f589b0794eeae518f6c23bfd0688f0f9
https://doi.org/10.1117/12.2584728
https://doi.org/10.1117/12.2584728
Autor:
Daniel Carlson, Michael Tanksalvala, Drew Morrill, Julio San Román, Enrique Conejero Jarque, Michaël Hemmer, Henry Kapteyn, Margaret Murnane
Publikováno v:
OSA Nonlinear Optics 2021.
We report simulations of nonlinear post-compression in multi-pass cells in the anomalous dispersion regime. By solving the nonlinear Schrödinger equation and mapping the parameter space we uncover regimes of self-compression, temporal soliton and mo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd7b24ac6926d909c8d48e56514db13f
https://doi.org/10.1364/nlo.2021.nm1a.3
https://doi.org/10.1364/nlo.2021.nm1a.3
Autor:
Bin Wang, Michael Tanksalvala, Zhe Zhang, Yuka Esashi, Nicholas W. Jenkins, Margaret Murnane, Henry Kapteyn, Chen-Ting Liao
Publikováno v:
Frontiers in Optics + Laser Science 2021.
Coherent Fourier scatterometry (CFS) using laser beams with a Gaussian spatial profile is routinely used as an in-line inspection tool in semiconductor industry. Here, a set of novel defect inspection techniques are proposed and investigated numerica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b55a9c4daf5b48b04bd28719b6afa50
https://doi.org/10.1364/fio.2021.jth5a.127
https://doi.org/10.1364/fio.2021.jth5a.127