Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Michael T. Mocella"'
Autor:
Hoang Vi Tran, Douglas J. Adelman, John J. Schmieg, Adams S. Bernfeld, Rebekah A. Derryberry, Eric Hendrickx, Mureo Kaku, Charles Y. Chen, Frieda Van Roey, Roger H. French, Michael T. Mocella, Nyrissa S. Rogado
Publikováno v:
Journal of Photopolymer Science and Technology. 21:631-639
We report on recent studies on two of our leading fluid candidates for high index immersion lithography, designated IF132 and IF169. The most recent fluid radiation durability results are discussed, leading us to define two important parameters, the
Autor:
Robert Clayton Wheland, Barbara Bobik Fones, Hoang Tran, Mureo Kaku, Luke W. Brubaker, Douglas J. Adelman, John J. Schmieg, Roger H. French, Jerald Feldman, M. F. Lemon, Michael T. Mocella, Weiming Qiu, Min K. Yang, Brian E. Fischel, Osami Nagao
Publikováno v:
Journal of Photopolymer Science and Technology. 20:729-738
Autor:
Michael T. Mocella
Publikováno v:
Journal of Fluorine Chemistry. 122:87-92
The semiconductor industry is now in the early stages of an unprecedented change in materials set for the integrated circuit (IC) interconnect structure. The traditional layers of aluminum conductors and silicon dioxide dielectrics are being replaced
Autor:
Mureo Kaku, Charles Y. Chen, Nyrissa S. Rogado, Hoang Vi Tran, Michael T. Mocella, Adam S. Bernfeld, Roger H. French, Freida Van Roey, Eric Hendrickx, Doug J. Adelman, Rebekah A. Derryberry
Publikováno v:
Optical Microlithography XXI.
We have performed high-index immersion fluid studies to define the levels of both soluble and insoluble impurities present. These studies have also revealed the importance of process materials' purity in fluid contact. Fluid interactions with resist,
Autor:
Herbert H. Sawin, Linda D. Baston, Gavin C. H. Zau, Igor Tepermeister, Michael T. Mocella, David C. Gray
Publikováno v:
Journal of The Electrochemical Society. 137:3526-3536
Autor:
K. E. Krohn, M. F. Lemon, L. Brubaker, Robert Clayton Wheland, Hoang Vi Tran, D. Hardy, S. J. McLain, Mureo Kaku, O. Nagao, Roger H. French, Douglas J. Adelman, Jerald Feldman, Charles Y. Chen, Vladimir Liberman, Michael T. Mocella, B. E. Fischel, Min K. Yang, A. L. Shoe, B. Fones, Weiming Qiu
Publikováno v:
SPIE Proceedings.
To identify the most practical and cost-effective technology after water immersion lithography (Gen1) for sub-45 nm half pitches, the semiconductor industry continues to debate the relative merits of water double patterning (feasible, but high cost o
Autor:
Michael T. Mocella
Publikováno v:
MRS Proceedings. 447
Perfluorocompounds (PFCs) are critical processing gases for a number of plasma-based IC processing steps, especially dry etching and in situ CVD chamber cleaning. The long atmospheric lifetimes and large infrared absorption cross sections for such ga
Autor:
Michael T. Mocella
Publikováno v:
MRS Proceedings. 344
Certain perfluorocompounds (PFCs) - including CF4, C2F6, SF6, and NF3 - are widely used in gas phase thin film processing applications such as dry etching and CVD chamber cleaning. Through a combination of long atmospheric lifetimes and high infrared
Publikováno v:
SPIE Proceedings.
Polysilicon etching in a single-wafer, parallel-plate, magnetically- enhanced RIE tool has been examined using two different approaches to the non-physical modeling of the system characteristics. The behavior of both process responses (polysilicon an
Autor:
Michael T. Mocella, Aaron J. Owens
Publikováno v:
Lecture Notes in Computer Science ISBN: 9783540545378
IWANN
IWANN
DANA [Design Advisor/Neural Analyzer] is a PC-based experimental design advisor and neural network analysis system for understanding and optimizing physical processes. Given a specified number of process inputs and outputs, the Design Advisor gives t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13e1b00a2783eafc680c766102964d71
https://doi.org/10.1007/bfb0035899
https://doi.org/10.1007/bfb0035899