Zobrazeno 1 - 10
of 40
pro vyhledávání: '"Michael Switkes"'
Autor:
Benjamin L. Ervin, Richard P. Kingsborough, Michael Sworin, Mordechai Rothschild, Michael Switkes
Publikováno v:
Sensors and Actuators B: Chemical. 160:1244-1249
We have developed a remote detection system consisting of commercially available retroreflective material coated with an analyte-specific colorimetric dye. Quantitative performance modeling predicts that, given the appropriate indicator dye, a system
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e275bd306a3b573042c0c123c4c8c5b
https://doi.org/10.1016/j.snb.2011.09.057
https://doi.org/10.1016/j.snb.2011.09.057
A simple micromachining approach to testing nanoscale metal–self-assembled monolayer–metal junctions
Autor:
T M Lyszczarz, M W Geis, T H Fedynyshyn, Michael Switkes, Steven J. Spector, Charles M. Wynn, R R Kunz, Mordechai Rothschild
Publikováno v:
Nanotechnology. 15:86-91
We present a 'flip chip' technique for testing electronic self-assembled monolayers (SAMs). Metal–SAM–metal junctions with contact areas of approximately (25 nm)2 and smaller have been created and tested. While the approach is similar in spirit t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40524bf995e70b6e4a36ed41b0c2bd7e
https://doi.org/10.1088/0957-4484/15/1/017
https://doi.org/10.1088/0957-4484/15/1/017
Autor:
Kevin J. Orvek, Michael Switkes, Theodore M. Bloomstein, William A. Mowers, Roger F. Sinta, Vladimir Liberman, Mordechai Rothschild, Theodore H. Fedynyshyn, Andrew Grenville
Publikováno v:
Journal of Fluorine Chemistry. 122:3-10
Fluorine—its chemical and physical properties—plays a critical role in the development of advanced photolithography. It is widely expected that, when in a few years the critical dimensions in microelectronic devices will be less than ∼70 nm, th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81ff571969eb8f026e733bf97253886a
https://doi.org/10.1016/s0022-1139(03)00074-5
https://doi.org/10.1016/s0022-1139(03)00074-5
Autor:
Theodore H. Fedynyshyn, Roderick R. Kunz, Theodore M. Bloomstein, Michael Switkes, Allen Keith Bates, Mordechai Rothschild, Vladimir Liberman
Publikováno v:
IBM Journal of Research and Development. 45:605-614
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d0121eff573009fcda690f042c43e1dc
https://doi.org/10.1147/rd.455.0605
https://doi.org/10.1147/rd.455.0605
Autor:
Vladimir Liberman, Roderick R. Kunz, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Mordechai Rothschild, Michael Switkes
Publikováno v:
Journal of Photopolymer Science and Technology. 13:369-372
This paper outlines the critical issues facing the implementation of 157-nm lithography as a sub-100-nm technology. Special emphasis is placed on 157-nm photoresist options, including ultrathin resists and thicker resists with new chemistries. The st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e022f4f999e950188edc9c471ac5d3d7
https://doi.org/10.2494/photopolymer.13.369
https://doi.org/10.2494/photopolymer.13.369
Publikováno v:
Applied Physics Letters. 77:3149-3151
We have implemented a space-invariant interference lithography tool for 157 nm F2 lasers, capable of creating dense line and space patterns with a spatial period of 91 nm. No gratings or curved optics are required, allowing a simple and inexpensive t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::481c7952818abf4b2a9ace7941979fef
https://doi.org/10.1063/1.1326490
https://doi.org/10.1063/1.1326490
Autor:
Hema Viswanath, Catherine Cabrera, Walter Zukas, James Harper, Theodore M. Lyszczarz, Michael Sennett, Mordechai Rothschild, Roderick R. Kunz, Lalitha Parameswaran, Michael Switkes
Publikováno v:
ACS Symposium Series ISBN: 9780841269811
Nanoscience and Nanotechnology for Chemical and Biological Defense
Nanoscience and Nanotechnology for Chemical and Biological Defense
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::293d70084406cf202b5816f86746419d
https://doi.org/10.1021/bk-2009-1016.ch002
https://doi.org/10.1021/bk-2009-1016.ch002
Autor:
D. E. Hardy, Vladimir Liberman, Andrew Grenville, Michael Switkes, Jan H. C. Sedlacek, Stephen T. Palmacci, Mordechai Rothschild
Publikováno v:
Optical Microlithography XVIII.
The final projection lens element in a 193-nm immersion-based lithographic tool will be in direct contact with water during irradiation. Thus, any lifetime considerations for the lens must include durability data of lens materials and thin films in a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0e2499e34816abf775f6205f85c5b35
https://doi.org/10.1117/12.601468
https://doi.org/10.1117/12.601468
Publikováno v:
Optical Microlithography XVIII.
We have designed and constructed a microstepper for 157 nm immersion lithography. The lens, designed and fabricated at Newport, provides a numerical aperture of 1.3 and a field size of 60 μm with immersion liquids of index n=1.38. Because of a lack
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d78d4e01a7636088fba0a2b698b4533e
https://doi.org/10.1117/12.602585
https://doi.org/10.1117/12.602585
Autor:
Theodore M. Bloomstein, Michael Switkes, Michael S. Yeung, Roderick R. Kunz, Jeffrey W. Ruberti, Mordechai Rothschild, Timothy A. Shedd
Publikováno v:
SPIE Proceedings.
We have measured the intrinsic scattering of water with an eye toward its potential impact on immersion lithography. Quantitative measurements of the elastic Rayleigh scatter agree well with theory and show a loss of 0.001 cm-1. Qualitative measureme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc419cc4bdd6d58a3d1f9f637cef70c8
https://doi.org/10.1117/12.534194
https://doi.org/10.1117/12.534194