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Autor:
Kenneth A. Jones, Vlad Sklyar, Michael Shevelev, Michael A. Derenge, Milena B. Graziano, Andrew C. Lang, Woongje Sung, Sean Tozier, Kasey Hogan, Mitra L. Taheri, F. Shadi Shahedipour-Sandvik
Publikováno v:
Gallium Nitride Materials and Devices XIV.
The advancement in potential selective placement of p-GaN regions places the gallium nitride (GaN) material system on the forefront of next generation power semiconductor devices. The ion implantation technique is commonly used in fabrication of semi