Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Michael Q. Hovish"'
Autor:
Nicholas Rolston, Michael Q. Hovish, Reinhold H. Dauskardt, Karsten Brüning, Florian Hilt, Christopher J. Tassone
Publikováno v:
Journal of Materials Chemistry A. 8:169-176
Rapid Spray Plasma Processing (RSPP) is a high throughput, scalable, and open-air route toward manufacturing perovskite solar modules. The plasma exposure is dosed such that the perovskite precursor solution is cured in milliseconds using a combinati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::043cedab74c3260a7472da97770d8128
https://doi.org/10.1039/c9ta07980g
https://doi.org/10.1039/c9ta07980g
Autor:
Christopher J. Tassone, Nicholas Rolston, Karsten Brüning, Florian Hilt, Michael Q. Hovish, Reinhold H. Dauskardt
Publikováno v:
Energy & Environmental Science. 11:2102-2113
We demonstrate a scalable atmospheric plasma route to rapidly form efficient and mechanically robust photoactive metal halide perovskite films in open air at linear deposition rates exceeding 4 cm s−1. Our plasma process uses clean dry air to produ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a120981dcfe74ca74f1c4c086cf37e30
https://doi.org/10.1039/c8ee01065j
https://doi.org/10.1039/c8ee01065j
Autor:
Nicholas Rolston, Michael Q. Hovish, Justin Chen, William J. Scheideler, Reinhold H. Dauskardt, Austin C. Flick, Oliver Zhao
Publikováno v:
ICMAT 2019.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb3648c43c6e93d0d891876b88c34ffd
https://doi.org/10.2172/1814027
https://doi.org/10.2172/1814027
Autor:
Karsten Brüning, Reinhold H. Dauskardt, Adam D. Printz, Michael Q. Hovish, Christopher J. Tassone, Florian Hilt, Nicholas Rolston
Publikováno v:
Journal of Materials Chemistry A. 5:22975-22983
We report on submicron organosilicate barrier films produced rapidly in air by a scalable spray plasma process that improves both the stability and efficiency of perovskite solar cells. The plasma is at sufficiently low temperature to prevent damage
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15cd8af1ae2f4ad320010bc76f84ea17
https://doi.org/10.1039/c7ta09178h
https://doi.org/10.1039/c7ta09178h
Publikováno v:
Advanced Functional Materials. 29:1806421
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95fab432687d4ab57fd46d4183c5f9b7
https://doi.org/10.1002/adfm.201806421
https://doi.org/10.1002/adfm.201806421
Publikováno v:
Journal of Physics D: Applied Physics. 49:395302
Thin films of tantalum oxynitride (TaO x N y ) and titanium oxynitride (TiO x N y ) are deposited using atmospheric plasma deposition and a suite of optical properties are reported. Tantalum and titanium ethoxide are introduced into the afterglow of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::687bdae3c5c687cd5af44954d243ebbe
https://doi.org/10.1088/0022-3727/49/39/395302
https://doi.org/10.1088/0022-3727/49/39/395302
Autor:
Richard J. Matyi, Benjamin D. Briggs, Nathaniel C. Cady, Jihan O. Capulong, S.M. Bishop, Michael Q. Hovish
Publikováno v:
2012 IEEE International Integrated Reliability Workshop Final Report.
This paper compares the resistive switching properties of crystalline and amorphous HfO x thin-film resistive memory devices (RMDs), which were fabricated by physical vapor deposition films using two different O 2 partial pressures. The crystallinity
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14579d870a1d072c38fac5b2a566d789
https://doi.org/10.1109/iirw.2012.6468907
https://doi.org/10.1109/iirw.2012.6468907
Autor:
Michael Q Hovish, Reinhold H Dauskardt
Publikováno v:
Journal of Physics D: Applied Physics; 10/5/2016, Vol. 49 Issue 39, p1-1, 1p