Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Michael P. Schlax"'
Autor:
Amr Y. Abdo, Edward G. Lovell, John W. Mitchell, Phillip L. Reu, William A. Beckman, Roxann L. Engelstad, Michael P. Schlax
Publikováno v:
SPIE Proceedings.
To extend optical lithography technology to the sub-100 nm linewidth regime, all mask-related distortions must be eliminated or minimized. Thermal distortion during the exposure process can be a significant contribution to the total pattern placement
Autor:
Lowell K. Siewert, Giang T. Dao, Edward G. Lovell, Eric P. Cotte, Roxann L. Engelstad, Michael P. Schlax, Andrew R. Mikkelson, Jun-Fei Zheng, Phillip L. Reu
Publikováno v:
SPIE Proceedings.
Potential transmission problems for polymeric pellicle membranes at 157 nm have led to alternative designs incorporating ultra-thin modified fused silica, i.e., so-called 'hard pellicles.' The mechanical characteristics of hard pellicles are unique.
Publikováno v:
SPIE Proceedings.
Lithography below sub-130 nm requires minimization of pattern distortions due to mask fabrication. It is essential to understand the impact of each step of the entire process flow, since the fabrication (and the resulting bow of the mask as well as t
Autor:
Cameron J. Brooks, Christopher Magg, Michael P. Schlax, Edward G. Lovell, Roxann L. Engelstad
Publikováno v:
SPIE Proceedings.
A crosscutting issue for Next Generation Lithographies is the ability to monitor and control the uniformity of thin film stresses. Because the global stress fields of thin film layers can introduce distortions in lithographic masks, it is essential t
Autor:
James Alexander Liddle, William H. Semke, Roxann L. Engelstad, Edward G. Lovell, Michael P. Schlax
Publikováno v:
SPIE Proceedings.
Controlling the dynamic response of the SCALPEL mask is important to ensure high throughput consistent with the stringent error budgets allocated for sub-130 nm lithography. In this paper experimental and numerical modal analysis result for the SCALP
Autor:
Edward G. Lovell, William H. Semke, Michael P. Schlax, Anthony E. Novembre, James Alexander Liddle, Gerald A. Dicks, Roxann L. Engelstad, Carl J. Martin
Publikováno v:
SPIE Proceedings.
A virtual mask laboratory has been developed at the UW Computational Mechanics Center to aid in the design and optimization of the SCALPEL mask. Finite element models have been generated to simulate the thermomechanical response of the mask during fa
Autor:
James Alexander Liddle, Roxann L. Engelstad, Michael P. Schlax, Edward G. Lovell, Anthony E. Novembre
Publikováno v:
SPIE Proceedings.
With the stringent error budget required for sub-130 nm lithography, the development of a low distortion mask is a key concern. Because the global stress field of a thin film layer can introduce distortions in the mask, it is essential that the chara
Publikováno v:
SPIE Proceedings.
Structural damping experiments on x-ray mask membranes have been conducted at the University of Wisconsin and are reported in this paper. For the experiments, the mask format complied with the ARPA-NIST National X-ray Mask Standard. Effective damping
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Conference
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