Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Michael N. Fairchild"'
Autor:
Jeremy B. Wright, Saadat Mishkat Ul Masabih, Ganesh Balakrishnan, Daniel F. Feezell, Steven R. J. Brueck, Ashwin K. Rishinaramangalam, Michael N. Fairchild, D. M. Shima, Igal Brener
Publikováno v:
Journal of Electronic Materials. 44:1255-1262
We demonstrate the growth of ordered arrays of nonpolar $$\{ 10\bar{1}0\} $$ core–shell nanowalls and semipolar $$ \{ 10\bar{1}1\}$$ core–shell pyramidal nanostripes on c-plane (0001) sapphire substrates using selective-area epitaxy and metal org
Autor:
L. Zhang, Petros Varangis, Michael N. Fairchild, Ashwin K. Rishinaramangalam, Stephen D. Hersee
Publikováno v:
Journal of Materials Research. 26:2293-2298
This study describes the elimination of threading dislocations (TDs) in GaN nanostructures. Cross-sectional transmission electron microscopy (XTEM) analysis reveals that the nominal [0001] line direction of a TD changes when it enters a GaN nanostruc
Autor:
Jerome K. Hyun, Ilke Arslan, Rolf Erni, Stephen D. Hersee, Michael N. Fairchild, David A. Muller
Publikováno v:
Nano Letters. 9:4073-4077
While nanowires show increasing promise for optoelectronic applications, probing the subwavelength details of their optical modes has been a challenge with light-based techniques. Here we report the excitation of dielectric optical waveguide modes in
Autor:
Ashwin K. Rishinaramangalam, Rhett F. Eller, Mohsen Nami, Benjamin N. Bryant, S. R. J. Brueck, D. M. Shima, Daniel F. Feezell, Michael N. Fairchild, Ganesh Balakrishnan
Publikováno v:
SPIE Proceedings.
The growth of ordered arrays of group III-nitride nanostructures on c-plane gallium nitride (GaN) on sapphire using selective-area metal organic chemical vapor deposition (MOCVD) is presented. The growth of these nanostructures promotes strain relaxa
Autor:
S. D. Hersee, Xinyu Sun, R. Bommena, D. Burckel, Steven R. J. Brueck, Andrew Frauenglass, Michael N. Fairchild, G. A. Garrett, M. Wraback
Publikováno v:
Journal of Applied Physics. 95:1450-1454
This article describes defect reduction mechanisms that are active during the growth of GaN by nanoheteroepitaxy on (0001) 6H SiC. Nanoheteroepitaxial (NHE) and planar GaN epitaxial films were grown and compared using transmission electron microscopy
Autor:
S. D. Hersee, R. Bommena, Shuang Zhang, Andrew Frauenglass, Xinyu Sun, David Zubia, Steven R. J. Brueck, D. Burckel, Michael N. Fairchild
Publikováno v:
IEEE Journal of Quantum Electronics. 38:1017-1028
We describe an ongoing study of nanoheteroepitaxy (NHE), the use of nanoscale growth-initiation areas for the integration of highly mismatched semiconductor materials. The concept and theory of NHE is briefly described and is followed by a discussion
Autor:
Daniel F. Feezell, D. M. Shima, Michael N. Fairchild, Saadat Mishkat Ul Masabih, Ganesh Balakrishnan, Ashwin K. Rishinaramangalam
Publikováno v:
CLEO: 2014.
We demonstrate selective-area growth of patterned III-nitride core-shell nanowalls with nonpolar InGaN quantum well shells over large areas. Transmission electron microscopy and photoluminescence are utilized to examine the growth morphology and emis
Autor:
Ashwin K. Rishinaramangalam, Mohsen Nami, Michael N. Fairchild, Darryl M. Shima, Ganesh Balakrishnan, S. R. J. Brueck, Daniel F. Feezell
Publikováno v:
Applied Physics Express. 9:059201
Autor:
Ashwin K. Rishinaramangalam, Michael N. Fairchild, S. R. J. Brueck, D. M. Shima, Ganesh Balakrishnan, Daniel F. Feezell, Mohsen Nami
Publikováno v:
Applied Physics Express. 9:032101
The fabrication of electrically injected triangular-nanostripe core–shell semipolar III–nitride LEDs (TLEDs) is demonstrated using interferometric lithography and catalyst-free bottom-up selective-area metal–organic chemical vapor deposition (M
Autor:
Stephen D. Hersee, Ganesh Balakrishnan, Daniel F. Feezell, Michael N. Fairchild, Ashwin K. Rishinaramangalam
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31:03C107
This work highlights the development of three-dimensional (3D) GaN templates grown by metal organic vapor phase epitaxy (MOVPE). These templates are ideally suited for the subsequent growth of nonpolar (11¯00) m-plane InGaN-based coaxial wire/wall l