Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Michael Kovalchick"'
Autor:
Eduardo P. Olaguer, Shelley Jeltema, Thomas Gauthier, Dustin Jermalowicz, Arthur Ostaszewski, Stuart Batterman, Tian Xia, Julia Raneses, Michael Kovalchick, Scott Miller, Jorge Acevedo, Jonathan Lamb, Jeff Benya, April Wendling, Joyce Zhu
Publikováno v:
Atmosphere, Vol 15, Iss 11, p 1360 (2024)
There was an error in the original publication [...]
Externí odkaz:
https://doaj.org/article/81602a8441ea4c75b2107d8d0ac38a46
Autor:
Eduardo P. Olaguer, Shelley Jeltema, Thomas Gauthier, Dustin Jermalowicz, Arthur Ostaszewski, Stuart Batterman, Tian Xia, Julia Raneses, Michael Kovalchick, Scott Miller, Jorge Acevedo, Jonathan Lamb, Jeff Benya, April Wendling, Joyce Zhu
Publikováno v:
Atmosphere, Vol 13, Iss 6, p 983 (2022)
Municipal solid waste landfills are significant sources of atmospheric methane, the second most important greenhouse gas after carbon dioxide. Large emissions of methane from landfills contribute not only to global climate change, but also to local o
Externí odkaz:
https://doaj.org/article/c54d2373bd374a5fa53599165518a9b2
Publikováno v:
SPIE Proceedings.
No Abstract Available.© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9869c53bb82454b4c77153850e905160
https://doi.org/10.1117/12.557700
https://doi.org/10.1117/12.557700
Autor:
Ken Mr. Buckmann, Long He, Marilyn Kamna, Steven Labovitz, Michael Kovalchick, Qi-De Qian, Jeff Farnsworth, Wen-Hao Cheng, Yulia Korobko, Wilman Tsai, Brian Irvine, R. Talevi
Publikováno v:
SPIE Proceedings.
Alternating Phase Shift Mask (APSM) reticles is critical to achieve sub 0.1 um poly gate lithography. Intrinsic APSM image inbalance can be resolved with various methods such as isotropic etch and aperture sizing, where positional line-shift can be r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb3baf457f813d4a6e4f05ed737b5ef1
https://doi.org/10.1117/12.410720
https://doi.org/10.1117/12.410720