Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Michael J. Parent"'
Autor:
Gregory Young, Michael J. Parent, Carl E. Larson, Blake Davis, William M. Lamanna, Nicolette Fender, David R. Medeiros, T. Robeledo, Gregory M. Wallraff, Jeff Meute
Publikováno v:
SPIE Proceedings.
As resist feature sizes have decreased and the performance demands on chemically amplified photoresists have increased the role of the photoacid generator (PAG) in determining overall resist performance has become increasingly apparent. Over the past
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c77c16ab044675bbf2d01757aad583a2
https://doi.org/10.1117/12.474215
https://doi.org/10.1117/12.474215
Autor:
Terry Kruger, Gerald J. Lillquist, Yuri Cheburkov, Karrie S. Moorhouse, Yifan Zhang, Pat M. Savu, Carl R. Kessel, Steve Brinduse, Grant Birznieks, Thomas A. Kestner, Michael J. Parent, Michael C. Pallazzotto, William M. Lamanna
Publikováno v:
SPIE Proceedings.
A new class of ionic photo-acid generators (PAGs) useful in chemically amplified photoresist formulations has been developed. The new PAGs are salts comprising a photoactive cation and a fluoroorganic sulfonylimide or sulfonylmethide anion. These hig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d467f9bca4c90490cfdec71b4532a30
https://doi.org/10.1117/12.474284
https://doi.org/10.1117/12.474284