Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Michael Hassoun"'
Publikováno v:
Mathematics, Vol 9, Iss 21, p 2753 (2021)
We study a phenomenon causing server time loss in ticket queues with balking and calling time. A customer who balks from the queue after printing a ticket leaves a virtual entity in the queue that requires server time to be cleared. The longer the qu
Externí odkaz:
https://doaj.org/article/fb107bc464f141cc82fb9180235fbce6
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing
We present a new set of simulation models, organized in a testbed. The aim of the testbed consists in providing researchers with a platform able to credibly represent the complexity of modern semiconductor manufacturing. The testbed is open to public
Autor:
Michael Hassoun, Evgeny Kagan
Publikováno v:
Natural Computing.
We demonstrate the role of randomness and altruism in the motion of artificial agents in a deterministic environment. A swarm of distributed autonomous agents with no possibility of coordination tracks a unique target. The goal is to reach the target
Publikováno v:
Annals of Operations Research. 289:449-458
We define and study a variant of the Moving Target Traveling Salesman Problem, with all targets confined to a line and moving at the same speed. Target may appear at different times and the agent’s (salesman’s) objective is to intercept all targe
Publikováno v:
WSC
In this paper, we study the impact of critical queue time (CQT) constraints in semiconductor wafer fabrication facilities (wafer fabs). Process engineers impose CQT constraints that require wafers to start a subsequent operation within a given time w
Autor:
Michael Hassoun
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 30:32-38
Based on previous results showing the tradeoff existing between cycle time (CT) and yield in fabs we propose to dynamically set the control limits of the statistical process control. The limits are determined based on the current level of congestion.
Publikováno v:
European Journal of Operational Research
European Journal of Operational Research, Elsevier, 2019, ⟨10.1016/j.ejor.2019.09.014⟩
European Journal of Operational Research, 2019, ⟨10.1016/j.ejor.2019.09.014⟩
European Journal of Operational Research, Elsevier, 2019, ⟨10.1016/j.ejor.2019.09.014⟩
European Journal of Operational Research, 2019, ⟨10.1016/j.ejor.2019.09.014⟩
In-line quality control is a crucial and increasingly constraining activity, in particular in high technology manufacturing. In this paper, we study a single metrology tool assigned to control the production quality of multiple heterogeneous machines
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::581645ad5f5623fc78d6cb7f68c8a96f
https://hal-emse.ccsd.cnrs.fr/emse-02333451
https://hal-emse.ccsd.cnrs.fr/emse-02333451
Publikováno v:
International Journal of Production Research
International Journal of Production Research, Taylor & Francis, 2019, pp.1-17. ⟨10.1080/00207543.2019.1614693⟩
International Journal of Production Research, 2019, pp.1-17. ⟨10.1080/00207543.2019.1614693⟩
International Journal of Production Research, Taylor & Francis, 2019, pp.1-17. ⟨10.1080/00207543.2019.1614693⟩
International Journal of Production Research, 2019, pp.1-17. ⟨10.1080/00207543.2019.1614693⟩
Motivated by the high investment and operational metrology cost, and subsequently the limited metrology capacity, in modern semiconductor manufacturing facilities, we model and solve the problem of optimally assigning the capacity of several imperfec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::da5cddc54dda96a1928a3e9714b884b2
https://hal-emse.ccsd.cnrs.fr/emse-02333446
https://hal-emse.ccsd.cnrs.fr/emse-02333446
Publikováno v:
2019 Winter Simulation Conference (WSC)
WSC
WSC
As part of an effort to present to the semiconductor manufacturing community an updated wafer fab testbed, we provide the first of two simulation models, namely a High-Volume/Low-Mix (HV/LM) fab simulation model. The model is realistic in scale and l
Publikováno v:
Computers & Operations Research. 53:301-308
Control limits in use at metrology stations are traditionally set by Yield requirements. Since deviations from these limits usually trigger a machine's stoppage, the inspection design has a direct impact on the station's availability, and thus on the