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pro vyhledávání: '"Michael Grillberger"'
Autor:
Holm Geisler, Martin Brueckner, Petra Hofmann, Matthias U. Lehr, Michael Grillberger, Eckhard Langer
Publikováno v:
EDFA Technical Articles. 14:4-12
The introduction of ultralow-k dielectrics is a recent milestone in the quest for higher clock speeds and lower power consumption in ICs. One tradeoff, however, is that interconnect stacks layered with low-k materials rather than SiO2 are more vulner
Dual cantilever beam (DCB) mechanical testing is applied to two kinds of chips, manufactured in the 45 nm technology node. Both chips consist of different numbers of ultra low-k (ULK) dielectric layers, however, they have similarly designed crack-sto
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::06e8d7085c03a0f7b4b4eb3cad75dab2
https://publica.fraunhofer.de/handle/publica/242825
https://publica.fraunhofer.de/handle/publica/242825