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pro vyhledávání: '"Michael Fahrenkopf"'
Autor:
Yusuke Toda, Takeshi Isogawa, Michael Fahrenkopf, Yoshifumi Sakamoto, Richard Wistrom, Masayuki Kagawa, Jed H. Rankin, Amy E. Zweber, Thomas Faure, Steven Nash
Publikováno v:
SPIE Proceedings.
Over time mask makers have been driven to low sensitivity e-beam resist materials to meet lithographic patterning needs. For 7-nm logic node, resolution enhancement techniques continue to evolve bringing more complexity on mask and additional mask bu