Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Michael E. Malinowski"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:425-432
A technique is described that uses a gas-phase species to mitigate the oxidation of a Mo/Si multilayer optic caused by either extreme UV (EUV) or electron-induced dissociation of adsorbed water vapor. It is found that introduction of ethanol (EtOH) i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::137adeda3452a48a88b9b9573030f113
https://doi.org/10.1116/1.1649344
https://doi.org/10.1116/1.1649344
Autor:
Obert R. Wood, William C. Sweatt, Kurt W. Berger, W. K. Waskiewicz, Daniel A. Tichenor, Donald Lawrence White, Richard H. Stulen, Richard R. Freeman, Marc D. Himel, David L. Windt, Jeffrey Bokor, Steven J. Haney, John E. Bjorkholm, L. A. Brown, Glenn D. Kubiak, Donald M. Tennant, William M. Mansfield, Tanya E. Jewell, Alastair A. MacDowell, Michael E. Malinowski
Publikováno v:
Applied optics. 32(34)
Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterize
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::049349f21fda670c0a21a5de2505210f
https://pubmed.ncbi.nlm.nih.gov/20856569
https://pubmed.ncbi.nlm.nih.gov/20856569
Autor:
Donald Lawrence White, Richard R. Freeman, Donald M. Tennant, William M. Mansfield, Michael E. Malinowski, Daniel A. Tichenor, L. A. Brown, Richard H. Stulen, Steven J. Haney, Kurt W. Berger, W. K. Waskiewicz, John E. Bjorkholm, Obert R. Wood, David L. Windt, Alastair A. MacDowell, Tanya E. Jewell, Glenn D. Kubiak, Jeffrey Bokor
Publikováno v:
Optics letters. 16(20)
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c1acabfa8efa5e3659c1e1c25660a731
https://pubmed.ncbi.nlm.nih.gov/19777030
https://pubmed.ncbi.nlm.nih.gov/19777030
Autor:
Michael E. Malinowski, Eric M. Gullikson, Steven E. Grantham, Jeffrey C. Robinson, Nhan Nguyen, Saša Bajt, Jennifer B. Alameda, Henry N. Chapman, Andrew Aquila, Charles S. Tarrio
Publikováno v:
SPIE Proceedings.
The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4fc0c0559ccaceba3bf38840270786bf
https://doi.org/10.1117/12.484966
https://doi.org/10.1117/12.484966
Autor:
Leonard E. Klebanoff, Saša Bajt, Michael E. Malinowski, W. Miles Clift, Charles A. Steinhaus, Donald E. Meeker
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet (EUV)-induced oxidation of silicon-capped, [Mo/Si] multilayer mirrors in the presence of background levels of water vapor is recognized as one of the most serious threats to multilayer lifetime since oxidation of the top silicon l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2866048c58a81dc471036696d6fe5408
https://doi.org/10.1117/12.499360
https://doi.org/10.1117/12.499360
Publikováno v:
Emerging Lithographic Technologies VI.
Carbon contamination removal was investigated using remote RF-O2, RF-H2, and atomic hydrogen experiments. Samples consisted of silicon wafers coated with 100 Angstrom sputtered carbon, as well as bare Si-capped Mo/Si optics. Samples were exposed to a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b8a4bfa14188d6bb94a2be0e7a7e34e
https://doi.org/10.1117/12.472319
https://doi.org/10.1117/12.472319
Autor:
Regina Soufli, Leonard E. Klebanoff, Michael E. Malinowski, Stanley Mrowka, W. Miles Clift, Chip Steinhaus
Publikováno v:
Emerging Lithographic Technologies VI.
The performance of Mo/Si multilayer mirrors (MLMs) used to reflect UV (EUV) radiation in an EUV + hydrocarbon (NC) vapor environment can be improved by optimizing the silicon capping layer thickness on the MLM in order to minimize the initial buildup
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c5df86ea9b0c1fa9fa3dba85c48c7be
https://doi.org/10.1117/12.472320
https://doi.org/10.1117/12.472320
Autor:
Philip A. Grunow, W. Miles Clift, Leonard E. Klebanoff, Michael E. Malinowski, Chip Steinhaus
Publikováno v:
SPIE Proceedings.
Carbon deposition and removal experiments on Mo/Si multilayer mirror (MLM) samples were performed using extreme ultraviolet (EUV) light on Beamline 12.0.1.2 of the Advanced Light Source, Lawrence Berkeley National Laboratory (LBNL). Carbon (C) was de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d31db9153074e28e2a3d4493140b135
https://doi.org/10.1117/12.436677
https://doi.org/10.1117/12.436677
Autor:
W. Miles Clift, Chip Steinhaus, Leonard E. Klebanoff, Philip A. Grunow, Alvin H. Leung, Michael E. Malinowski, Steven J. Haney
Publikováno v:
SPIE Proceedings.
The first environmental data from the Engineering Test Stand (ETS) has been collected. Excellent control of high-mass hydrocarbons has been observed. This control is a result of extensive outgas testing of components and materials, vacuum compatible
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::539c359a8e65be1572de5e7cb13a43df
https://doi.org/10.1117/12.436676
https://doi.org/10.1117/12.436676
Autor:
Leonard E. Klebanoff, Marco Wedowski, W. Miles Clift, Michael E. Malinowski, Eric M. Gullikson, James A. Folta, Saša Bajt, Ulf Kleineberg
Publikováno v:
SPIE Proceedings.
Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging fro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0187a2c69fbd4e92010234a3cf7e525
https://doi.org/10.1117/12.371120
https://doi.org/10.1117/12.371120