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Publisher Summary Jet Vapor DepositionTM (JVDTM) uses high-speed inert gas jets to carry film components to substrates. JVD has been applied to a wide range of thin and thick film applications, demonstrating an adaptability to new problems, and a ver
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::136b24013f59184f18f0dc5104e6cecb
https://doi.org/10.1016/b978-0-8155-2031-3.00018-1
https://doi.org/10.1016/b978-0-8155-2031-3.00018-1
