Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Michael D. Goodner"'
Autor:
Michael L. McSwiney, J. Bao, Mansour Moinpour, Huai Huang, Paul S. Ho, Michael D. Goodner, Hualiang Shi, Grant M. Kloster
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 28:207-215
Oxygen plasma damage to blanket and patterned ultralow-κ (ULK) dielectric surfaces was investigated by examining the effect of plasma species and dielectric materials. Blanket ULK films and patterned structures were treated by O2 plasma in a remote
Publikováno v:
Chemical Engineering Science. 57:887-900
A comprehensive kinetic model describing photopolymerization is developed which allows variation of temperature, species concentrations, and light intensity through the thickness of a photopolymerized film. Heat and mass transfer effects are included
Publikováno v:
Industrial & Engineering Chemistry Research. 39:2797-2806
A model for unsteady-state solid-state polycondensation (SSP) is developed and is applied to the polymerization of poly(bisphenol A carbonate) and poly(ethylene terephthalate) (PET). The model assumes that diffusion of the reaction condensate in the
Autor:
Joseph M. DeSimone, George W. Roberts, Stephen M. Gross, Douglas J. Kiserow, Michael D. Goodner
Publikováno v:
Journal of Applied Polymer Science. 79:928-943
A kinetic model for the solid-state polymerization of poly(bisphenol A carbonate) in a single particle has been developed and used to investigate the broadening of molecular-weight distribution as a result of slow condensate diffusion. The model is b
Publikováno v:
Macromolecules. 32:6552-6559
In industrial photopolymerization processes, high light intensities are used to achieve fully cured products in short exposure times. Under these conditions, a high concentration of primary radicalsthose radicals derived directly from the photocleava
Publikováno v:
Industrial & Engineering Chemistry Research. 36:1247-1252
Free-radical homopolymerizations of 2-hydroxyethyl methacrylate (HEMA) and diethylene glycol dimethacrylate (DEGDMA) photoinitiated by 2,2-dimethoxy-2-phenylacetophenone (DMPA) were studied. A nove...
Autor:
Hualiang Shi, Grant M. Kloster, J. Bao, Huai Huang, Junjun Liu, Paul S. Ho, Mansour Moinpour, Michael D. Goodner
Publikováno v:
Scopus-Elsevier
During an O2 plasma ashing process, carbon depletion and subsequent moisture uptake caused increase of keff and the leakage current in an organosilicate (OSG) low-k dielectric. For dielectric restoration, additional CH4 plasma treatment on the O2 pla
Autor:
Junjun Liu, J. Bao, Hualiang Shi, Grant M. Kloster, Paul S. Ho, Michael D. Goodner, Mansour Moinpour, Huai Huang
Publikováno v:
2007 IEEE International Interconnect Technology Conferencee.
A mechanistic study was performed to investigate plasma damage and CFL, recovery of porous carbon-doped oxide (CDO) low k surfaces. First the nature of damage was examined for different plasma treatments in a standard RIE chamber then followed by a s
Autor:
David W. Johnson, Tran M. Phung, Michael D. Goodner, Clay Mortensen, George Antonelli, Mansour Moinpour
Publikováno v:
MRS Proceedings. 914
The electrical and mechanical properties of low-k dielectric materials have received a great deal of attention in recent years; however, measurements of thermal properties such as the coefficient of thermal expansion remain minimal. This absence of d
Publikováno v:
Solvent-Free Polymerizations and Processes ISBN: 9780841235915
Solvent-Free Polymerizations and Processes: Minimization of Conventional Organic Solvents
Solvent-Free Polymerizations and Processes: Minimization of Conventional Organic Solvents
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::646f9c2e63e86ddcf5007e1b02157fa6
https://doi.org/10.1021/bk-1998-0713.ch014
https://doi.org/10.1021/bk-1998-0713.ch014