Zobrazeno 1 - 10
of 84
pro vyhledávání: '"Michael D. Bremser"'
Publikováno v:
physica status solidi (a). 183:151-155
A set of GaN epilayers grown by metalorganic chemical vapor deposition on 6H-SiC substrates was studied by time-resolved photoluminescence (PL) spectroscopy. The PL spectra are dominated by the free A exciton (FE A ) and by the neutral-donor-bound ex
Autor:
N. V. Edwards, Robert F. Davis, T. Wethkamp, Irina Buyanova, K. Wilmers, David E. Aspnes, S. D. Yoo, Norbert Esser, C. Cobet, Bo Monemar, A. D. Batchelor, Lynnette D. Madsen, Michael D. Bremser
Publikováno v:
Thin Solid Films. 364:98-106
Our work primarily concerns the characterization of wide-gap III-V nitride semiconductors, nondestructively and at variable temperature, with spectroscopic ellipsometry (SE) and reflectometry in the spectral range from 1.5 to 6 eV. In the case of GaN
Autor:
Robert F. Davis, Irina Buyanova, N. V. Edwards, Hiroshi Amano, Weimin Chen, Michael D. Bremser, J. L. Lindström, Isamu Akasaki, Matthias Wagner, Bo Monemar
Publikováno v:
Physical Review B. 60:1746-1751
Photoluminescence (PL) spectroscopy is employed to determine the nature of a near-infrared PL emission with a no-phonon line at ∼0.88 eV, commonly present in electron-irradiated GaN. This PL emission is suggested to originate from an internal trans
Autor:
Philip Ryan, Kevin E. Smith, Michael D. Bremser, Y.-C. Chao, James E. Downes, D. Hanser, Robert F. Davis, Cristian Stagarescu
Publikováno v:
Physical Review B. 59:R15586-R15589
The electronic structure of {ital n}-type, Si-doped, wurtzite GaN(0001)1{times}1 surfaces has been studied using synchrotron radiation excited angle-resolved photoemission. The GaN thin films were grown by metal-organic chemical-vapor deposition on S
Autor:
Tsvetanka Zheleva, Darren B. Thomson, Andrew D. Hanser, Robert F. Davis, Thomas Gehrke, Okhyun Nam, Michael D. Bremser
Publikováno v:
Diamond and Related Materials. 8:288-294
Advancements in the doping of GaN and AlxGa1−xN thin films, and the growth of GaN and AlxGa1−xN structures on patterned heterostructure substrates via metalorganic vapor phase epitaxy are reported. The acceptor-type behavior of Mg-doped GaN films
Autor:
T. J. Schmidt, W. G. Perry, Jerzy S. Krasinski, W. Yang, B. Goldenberg, S. Bidnyk, B. D. Little, Yong-Hoon Cho, Robert F. Davis, J. J. Song, Michael D. Bremser
Publikováno v:
Journal of Applied Physics. 85:1792-1795
We report the results of an experimental study on stimulated and spontaneous emission from high-quality single-crystal GaN films grown on 6H-SiC and (0001) sapphire substrates in the temperature range of 300–700 K. We observed edge-emitted stimulat
Autor:
N. V. Edwards, Michael D. Bremser, David E. Aspnes, Lynnette D. Madsen, A. D. Batchelor, Robert F. Davis, Bo Monemar, Irina Buyanova
Publikováno v:
MRS Internet Journal of Nitride Semiconductor Research. 4:423-428
We have developed a method to modulate the strain state (normally > 4 kbar, tensile) of moderately thick (∼2 μm) GaN based structures grown on 6H-SiC to a range 0 to -2 kbar of compressive stresses by introducing a strain-mediating layer (SML) abo
Autor:
Adam Barcz, Jakub Jasiński, Michael D. Bremser, Eliana Kamińska, Krystyna Gołaszewska, J. Kozubowski, Darren B. Thomson, Anna Piotrowska, Robert F. Davis
Publikováno v:
ResearcherID
Structural transformations in Ni/Si-based contacts to GaN occurring under heat treatment have been studied using transmission electron microscopy and secondary ion mass spectrometry. Transition from non-ohmic to ohmic behavior correlates with reactio
Autor:
Kieran Mark Tracy, Robert F. Davis, Robert J. Nemanich, J. P. Barnak, Sean W. King, Carsten Ronning, Michael D. Bremser
Publikováno v:
Journal of Applied Physics. 84:5248-5260
Successful ex situ and in situ cleaning procedures for AlN and GaN surfaces have been investigated and achieved. Exposure to HF and HCl solutions produced the lowest coverages of oxygen on AlN and GaN surfaces, respectively. However, significant amou
Autor:
Robert F. Davis, R. Loesing, Dieter P. Griffis, W. G. Perry, D. A. Ricks, Okhyun Nam, Michael D. Bremser
Publikováno v:
Journal of Electronic Materials. 27:229-232
Thin films of Si-doped AlxGa1−xN (0.03≤x≤0.58) having smooth surfaces and strong near-band edge cathodoluminescence were deposited at 0.35–0.5 µm/h on on-axis 6H-SiC(0001) substrates at 1100°C using a 0.1 µm AlN buffer layer for electrical