Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Michael Current"'
Autor:
Michael Current
Publikováno v:
Reference Services Review. 51:13-32
PurposeThis paper presents a novel approach to associating patron interactions with specific student learning objectives (SLOs) incorporated into reference transactions in an environment where learning, as opposed to usage or user satisfaction data,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39484f1d647b95c5100a737c180a30c9
https://doi.org/10.1108/rsr-03-2022-0011
https://doi.org/10.1108/rsr-03-2022-0011
UV-Photoreflectance and Raman Characterization of Strain Relaxation in Si on Silicon-Germanium Films
Autor:
Michael Current, Will Chism, Woo Sik Yoo, Victor Vartanian, David G. Seiler, Alain C. Diebold, Robert McDonald, Amal Chabli, Erik M. Secula
Publikováno v:
AIP Conference Proceedings.
Photoreflectance (PR), using a uv (374 nm) diode laser probe beam, and Raman spectroscopy, using a multi‐wavelength Ar+ laser coupled to a high‐resolution multi‐wavelength spectrometer, were used to characterize the strain relaxation of Si top
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8224518f78b165628afef977a449fd11
https://doi.org/10.1063/1.3657884
https://doi.org/10.1063/1.3657884
Autor:
John O. Borland, John Marino, Michael Current, Blake Darby, Jiro Matsuo, Masataka Kase, Takaaki Aoki, Toshio Seki
Publikováno v:
AIP Conference Proceedings.
Boron 200 eV p+ USJ dopant activation and junction leakage was studied with various combinations of PAI (Ge, B36, In & Xe) and HALO (As & Sb) implantation using msec laser annealing between 1220 °C and 1350 °C. For B only case without PAI or HALO,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cebb01576f977722bfecc44a524df4c7
https://doi.org/10.1063/1.3548325
https://doi.org/10.1063/1.3548325
Publikováno v:
SPIE Proceedings.
Photo-reflectance (PR) provides an optical means for rapid and precise measurement of near-surface electric fields in semiconductor materials. This paper details the use of photo-reflectance to characterize dopant activation in ultra-shallow junction
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9328b981da59817677f8a669ea352eac
https://doi.org/10.1117/12.830900
https://doi.org/10.1117/12.830900
Autor:
Jeffri Halim, Akira Mineji, Vladimir Faifer, Michael Current, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko
Publikováno v:
AIP Conference Proceedings.
High spatial resolution sheet resistance measurements, based on analysis of junction photo‐voltage (JPV) signals, are used to reveal subtle dose uniformity variations for 40 and 90 keV Boron implants in the dose range of 1011 B/cm2. The use of vari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c6230caa3cf9ab0ee9078c921e83027
https://doi.org/10.1063/1.3033585
https://doi.org/10.1063/1.3033585
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:C1C15-C1C20
Photoreflectance (PR) provides an optical means for rapid and precise measurement of near-surface electric fields in semiconductor materials. This article details the use of PR to characterize dopant activation in ultrashallow junction (USJ) structur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5dd0ec54b7018bf6017a6671681bdcd
https://doi.org/10.1116/1.3253327
https://doi.org/10.1116/1.3253327
Autor:
Michael Current
Publikováno v:
MRS Bulletin. 20:58-58
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8bb42d89c1735f7af6d109e59fff67f
https://doi.org/10.1557/s0883769400037003
https://doi.org/10.1557/s0883769400037003
Autor:
H. M. Gilder, Michael Current
Publikováno v:
Physical Review B. 16:2386-2391
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b9ab7e9eaca9b2321ea1680b818f6ff5
https://doi.org/10.1103/physrevb.16.2386
https://doi.org/10.1103/physrevb.16.2386
Publikováno v:
Journal of the Air Pollution Control Association. 26:787-790
The emphasis on participate control from industrial processes has been shifted recently towards fine particulates, having diameters less than 3 microns. There exists an urgent need for more scientific information of fine particle characterization.1,2
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d45f0840e4156077c05d35c34fc2b918
https://doi.org/10.1080/00022470.1976.10470315
https://doi.org/10.1080/00022470.1976.10470315
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 21:v
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fd4ba5355e2f04e6b45c6779dbf2ec5
https://doi.org/10.1016/0168-583x(87)90129-7
https://doi.org/10.1016/0168-583x(87)90129-7