Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Michael Caterer"'
Autor:
Dennis Plouffe, Satoshi Akutagawa, Monica Barrett, Robert Nolan, Michael Caterer, Nancy Zhou, Takashi Mizoguchi
Publikováno v:
SPIE Proceedings.
Photomask flatness and image placement specifications for advanced technology masks are becoming more stringent. Therefore, it is important to understand the various factors that affect final photomask flatness due to the direct impact it has on imag
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::88993780b12a9d6adb781351d2fc4a31
https://doi.org/10.1117/12.865005
https://doi.org/10.1117/12.865005
Autor:
Robert Nolan, Jason P. Ritter, Changbao Wang, Alfred Wagner, Takashi Mizoguchi, Corbin Imai, Kevin Duong, Michael Caterer, Monica Barrett, Nancy Zhou, Dennis Plouffe, Satoshi Akutagawa
Publikováno v:
SPIE Proceedings.
With the advancement of technology, the need to produce flatter photomasks is critical to meet strict mask manufacturing requirements. Components such as pellicle mounting techniques, pellicle frame height, frame material and adhesive all play an imp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::12201b27c2831b45c9eeae444cadab25
https://doi.org/10.1117/12.865042
https://doi.org/10.1117/12.865042
Autor:
Ken Racette, Robert Nolan, Monica Barrett, Glenn Dickey, David Hasselbeck, Michael Caterer, Toru Shirasaki, Nancy Zhou, Satoshi Akutagawa, Takashi Mizoguchi
Publikováno v:
SPIE Proceedings.
Previous work has shown that photomask blank flatness as well as photomask patterning and pelliclization all play an important role in finished photomask flatness. Additional studies have shown that pellicle mounting techniques, pellicle adhesives, f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e10b0c9784edc32f4c871abee9079e9f
https://doi.org/10.1117/12.824250
https://doi.org/10.1117/12.824250
Autor:
Takashi Mizoguchi, Nancy Zhou, Dennis Plouffe, Satoshi Akutagawa, Monica Barrett, Michael Caterer, Robert Nolan, Kenneth C. Racette
Publikováno v:
SPIE Proceedings.
As technology advances, the demand for tighter photomask final flatness specifications becomes greater. Studies have shown that the process of mounting a pellicle induces the largest change in flatness in photomask fabrication. Photomask pellicles pl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ebc99dc5b9795193ab8ee5a24307e9c
https://doi.org/10.1117/12.824303
https://doi.org/10.1117/12.824303
Autor:
D. Hasselbeck, Monica Barrett, Michael Caterer, Robert Nolan, Nancy Zhou, Michael S. Hibbs, Jason P. Ritter, T. Mizoguchi, Kenneth C. Racette, Alfred Wagner, F. Houle
Publikováno v:
Photomask Technology 2008.
Advanced immersion lithography utilizes higher numerical aperture (NA) stepper lenses resulting in higher angles of light illumination through photomasks. Transmission in conventional pellicles (830 nm thickness) is generally maximized at 0 degree il
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a5e537856bc38606139a4f729e08cd87
https://doi.org/10.1117/12.801663
https://doi.org/10.1117/12.801663