Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Michael Budach"'
Autor:
Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Hubertus Marbach, Klaus Edinger, G. S. Oehrlein
Publikováno v:
Journal of Vacuum Science & Technology A. 41:013004
Electron-stimulated etching of surfaces functionalized by remote plasma is a flexible and novel approach for material removal. In comparison with plasma dry etching, which uses the ion-neutral synergistic effect to control material etching, electron
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a2460bceb88c487d813cfff992ec181
https://doi.org/10.1116/6.0002234
https://doi.org/10.1116/6.0002234
SiO2 etching and surface evolution using combined exposure to CF4/O2 remote plasma and electron beam
Autor:
Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Klaus Edinger, G. S. Oehrlein
Publikováno v:
Journal of Vacuum Science & Technology A. 40:063004
Electron-based surface activation of surfaces functionalized by remote plasma appears like a flexible and novel approach to atomic scale etching and deposition. Relative to plasma-based dry etching that uses ion bombardment of a substrate to achieve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a33b3572155aeac2e9edb10b8836c29e
https://doi.org/10.1116/6.0002038
https://doi.org/10.1116/6.0002038
Autor:
Nicole Auth, K. Wolff, Jens Oster, Michael Budach, Markus Waiblinger, H. Steigerwald, Thorsten Hofmann, Petra Spies, Horst Schneider, Klaus Edinger
Publikováno v:
SPIE Proceedings.
Mask repair is an essential step in the mask manufacturing process as the extension of 193nm technology and the insertion of EUV are drivers for mask complexity and cost. The ability to repair all types of defects on all mask blank materials is cruci
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::369e2e085e0ede07c6fb51b8cbadb314
https://doi.org/10.1117/12.2072474
https://doi.org/10.1117/12.2072474
Autor:
Michael Penn, Michael Budach, Dan Bald, Klaus Edinger, Ted Liang, Petra Spies, Volker Boegli, Alan R. Stivers, Chetan Sethi
Publikováno v:
SPIE Proceedings.
In this paper, we present the test results obtained from the first commercial electron beam mask repair tool. Repaired defect sites on chrome-on-glass masks are characterized with 193nm AIMS to quantify the edge placement precision as well as optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::990f81def33ca52b4b362c07b7d78ac9
https://doi.org/10.1117/12.557788
https://doi.org/10.1117/12.557788
Autor:
Susanne G÷hde, Klaus Edinger, Hans W. P. Koops, Volker Bert, Thorsten Hofmann, Volker Boegli, Ottmar Hoinkis, Michael Budach, Petra Spies, Rainer Becker, Jochen Guyot, Hans Becht, Johannes Bihr, Bernd Weyrauch, Alexander Kaya
Publikováno v:
SPIE Proceedings.
High-resolution electron-beam assisted deposition and etching is an enabling technology for current and future generation photo mask repair. NaWoTec in collaboration with LEO Electron Microscopy has developed a mask repair beta tool capable of proces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e789aa77dc8838747f0c21e0dfec7564
https://doi.org/10.1117/12.532866
https://doi.org/10.1117/12.532866
Autor:
Jens Greiser, Johannes Bihr, Hans W. P. Koops, Bernd Weyrauch, Klaus Edinger, Volker Boegli, Ottmar Hoinkis, Michael Budach
Publikováno v:
SPIE Proceedings.
An electron beam technology for repair of Next Generation Lithography masks is described. Deposition of missing material in clear defects is shown with different material characteristics. Etching of opaque defects is demonstrated. The superiority of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::68119b011f3789e77e9b79143fb6b893
https://doi.org/10.1117/12.504061
https://doi.org/10.1117/12.504061
Autor:
Stephan Braeuer, Michael Eisenmann, Heinz Honold, Andreas Reinhardt, Alexander Kaya, Rainer Becker, Klaus Edinger, Volker Boegli, Hans W. P. Koops, Johannes Bihr, Rudolf Schmidt, Ottmar Hoinkis, Bernd Weyrauch, Jens Greiser, Michael Budach
Publikováno v:
SPIE Proceedings.
The applicability of electron-beam induced chemical reactions to mask repair is investigated. To achieve deposition and chemical etching with a focused electron-beam system, it is required to disperse chemicals in a molecular beam to the area of inte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8cc51aefa4e96f85a3f8a0b4f012865f
https://doi.org/10.1117/12.468200
https://doi.org/10.1117/12.468200