Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Michael, L. McSwiney"'
Autor:
Michael L. McSwiney, J. Bao, Mansour Moinpour, Huai Huang, Paul S. Ho, Michael D. Goodner, Hualiang Shi, Grant M. Kloster
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 28:207-215
Oxygen plasma damage to blanket and patterned ultralow-κ (ULK) dielectric surfaces was investigated by examining the effect of plasma species and dielectric materials. Blanket ULK films and patterned structures were treated by O2 plasma in a remote
Autor:
Huai Huang, Junjing Bao, Junjun Liu, Ryan Scott Smith, Yangming Sun, Paul S. Ho, Michael L. McSwiney, Mansour Moinpour, Grant M Kloster
Publikováno v:
Scopus-Elsevier
Methyl depletion and subsequent moisture uptake have been found to be the primary plasma damages leading to dielectric loss in porous organosilicate (OSG) low-k dielectrics. A vacuum vapor silylation process was developed for dielectric recovery of p
Autor:
J. Bao, Ryan Scott Smith, Michael L. McSwiney, Mansour Moinpour, Paul S. Ho, Hualiang Shi, Grant M. Kloster, Haiyu Harry Huang, Junjun Liu
Publikováno v:
Applied Physics Letters. 93:192909
This study investigated the origin of dielectric loss induced by O2 plasma on organo-silicate glass low-k dielectrics. The contributions from the polarization components to dielectric constant were delineated by analyzing the results from capacitance
Autor:
Shi, Hualiang, Bao, Junjing, Huang, Huai, Liu, Junjun, Ryan, Scott Smith, Sun, Yangming, Paul, S. Ho, Michael, L. McSwiney, Moinpour, Mansour, Grant, M. Kloster
Publikováno v:
MRS Online Proceedings Library; 2008, Vol. 1079 Issue 1, p1-6, 6p