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pro vyhledávání: '"Micahel J. Leeson"'
Autor:
Manish Chandhok, Gilroy Vandentop, Micahel J. Leeson, E. Steve Putna, Grant M. Kloster, Uday Shah, Todd R. Younkin
Publikováno v:
Journal of Photopolymer Science and Technology. 24:127-136
Extreme Ultraviolet (EUV) lithography is a leading technology option for manufacturing at the 22nm half pitch node and beyond. Implementation of the technology will require continued progress on several key supporting infrastructure challenges, inclu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3411a40c38c1464757f5d5cb77f9f009
https://doi.org/10.2494/photopolymer.24.127
https://doi.org/10.2494/photopolymer.24.127
