Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Mi-Rim Jung"'
Publikováno v:
The Journal of Korean Medicine Ophthalmology and Otolaryngology and Dermatology. 29:33-55
Objectives : The aim of this study is to analyze research of Korean medicine for the treatment of seborrheic dermatitis. Methods : We searched domestic journals with the title ‘seborrheic, de rmatitis, 脂漏, 面遊風, 白屑風, 紐扣風’. We
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d2df254578c62e4e2c990200602947c
https://doi.org/10.6114/jkood.2016.29.2.033
https://doi.org/10.6114/jkood.2016.29.2.033
Autor:
Michael E. Adel, Mark D. Smith, Sangjun Han, Dongsub Choi, Myungjun Lee, Efi Megged, Anna Golotsvan, Joonseuk Lee, Tal Itzkovich, Amnon Manassen, Yuri Paskover, Victoria Naipak, Dohwa Lee, Tom Leviant, Honggoo Lee, Zephyr Liu, Vladimir Levinski, Mi-Rim Jung, Young-Sik Kim
Publikováno v:
SPIE Proceedings.
In recent years, lithographic printability of overlay metrology targets for memory applications has emerged as a significant issue. Lithographic illumination conditions such as extreme dipole, required to achieve the tightest possible pitches in DRAM
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::305ceb1659a85f9daa6b6d66fd9b6170
https://doi.org/10.1117/12.2258376
https://doi.org/10.1117/12.2258376
Publikováno v:
The Acupuncture. 30:79-85
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d92a8652334869ab08d900a9f26bf01b
https://doi.org/10.13045/acupunct.2013024
https://doi.org/10.13045/acupunct.2013024
Autor:
Dongsub Choi, Myungjun Lee, Zephyr Liu, Vladimir Levinski, Michael E. Adel, Tal Itzkovich, Sangjun Han, Mi-Rim Jung, Young-Sik Kim, Kangsan Lee, Mark D. Smith, Ady Levy, Dohwa Lee, Honggoo Lee, Joonseuk Lee
Publikováno v:
SPIE Proceedings.
We present a metrology target design (MTD) framework based on co-optimizing lithography and metrology performance. The overlay metrology performance is strongly related to the target design and optimizing the target under different process variations
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e44c54bc168e356e764d66526b929b5c
https://doi.org/10.1117/12.2218653
https://doi.org/10.1117/12.2218653
Publikováno v:
The Journal of the Korea Contents Association. 10:438-448
This study is aimed for a scale of assessing the work performance, educational operations, and so on of preschool teachers by the peers. It has been previously discussed the studies of scale assesment of preschool teachers, however, the scale assesme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4bd26b5d217ce4d0079108a853180316
https://doi.org/10.5392/jkca.2010.10.7.438
https://doi.org/10.5392/jkca.2010.10.7.438
Autor:
Sean Park, Nang-Lyeom Oh, Won-Taik Kwon, Mir Shahrjerdy, Jin-Moo Byun, Chris Park, Youping Zhang, Ji-Hwan Yoo, Paul Tuffy, Mi-Rim Jung, Roy Werkman, Kevin Ryan, Kyu-Tae Sun, Young-Sun Hwang, Young-Sik Kim
Publikováno v:
SPIE Proceedings.
In order to handle the upcoming 1x DRAM overlay and yield requirements, metrology needs to evolve to more accurately represent product device patterns while being robust to process effects. One way to address this is to optimize the metrology target
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d25c03e362403fa0d4cd130c7a2dd936
https://doi.org/10.1117/12.2085645
https://doi.org/10.1117/12.2085645
Publikováno v:
SPIE Proceedings.
The desired minimum feature size is decreasing for the future technology nodes. Immersion lithography has been actively pursued as a method of extending the resolution of optical lithography beyond 65 nm mode. Immersion lithography and hyper NA impac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9618ad9b94369571d7f260b3dce018a
https://doi.org/10.1117/12.656983
https://doi.org/10.1117/12.656983
Publikováno v:
SPIE Proceedings.
The minimum feature size of the semiconductor device will be smaller and smaller because of the increasing demand for the high integration of the device. According to recently proposed roadmap, ArF immersion lithography will be used for 65 nm to 45 n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a504c171659729c3e09cc97b7380cece
https://doi.org/10.1117/12.656204
https://doi.org/10.1117/12.656204
Autor:
Dai-Gyoung Kim, Kang Baek Kim, Mi-Rim Jung, Hye-Keun Oh, Jong-Sun Kim, Jun-Tack Park, Hye-Young Kang, Joo-Yoo Hong, Ji-Eun Lee
Publikováno v:
SPIE Proceedings.
Resist reflow is a simple and cost effective technique by which the resist is baked above the glass transition temperature (Tg) after the typical contact hole pattern has been exposed, baked and developed. Resist reflow method can obtain very high re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2330eae34f44da0c5c331a000069de8
https://doi.org/10.1117/12.656286
https://doi.org/10.1117/12.656286
Publikováno v:
Japanese Journal of Applied Physics. 45:9280
Immersion lithography uses a hyper-numerical aperture (NA) to make smaller patterns and this hyper-NA imaging needs serious consideration of polarization effects. Immersion lithography using a hyper-NA affects the selection and optimization of variou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69e731f269d382fecfc8eb563b82d5d4
https://doi.org/10.1143/jjap.45.9280
https://doi.org/10.1143/jjap.45.9280