Zobrazeno 1 - 10
of 40
pro vyhledávání: '"Mi-Hee Ji"'
Autor:
Daryl Key, Edward Letts, Chuan-Wei Tsou, Mi-Hee Ji, Marzieh Bakhtiary-Noodeh, Theeradetch Detchprohm, Shyh-Chiang Shen, Russell Dupuis, Tadao Hashimoto
Publikováno v:
Materials, Vol 12, Iss 12, p 1925 (2019)
Free-standing gallium nitride (GaN) substrates are in high demand for power devices, laser diodes, and high-power light emitting diodes (LEDs). SixPoint Materials Inc. has begun producing 2” GaN substrates through our proprietary Near Equilibrium A
Externí odkaz:
https://doaj.org/article/1576668a9ca04c5d8082f83c74188a0c
Autor:
Hoon Jeong, E. A. Garzda, Mi-Hee Ji, Minkyu Cho, Theeradetch Detchprohm, Shyh-Chiang Shen, A. N. Otte, Russell D. Dupuis
Publikováno v:
IEEE Journal of Quantum Electronics. 59:1-8
Autor:
Russell D. Dupuis, Jiming Bao, Theeradetch Detchprohm, Shahab Shervin, Tain Tong, Kamrul Alam, R. L. Forrest, Mi-Hee Ji, Jae-Hyun Ryou, Sara Pouladi, Jie Chen, Mina Moradnia
Publikováno v:
Journal of Materials Chemistry C. 9:2243-2251
Flexible electronics and mechanically bendable devices based on Group III-N semiconductor materials are emerging; however, there are several challenges in manufacturing, such as cost reduction, device stability and flexibility, and device-performance
Autor:
Pooran Chandra Joshi, Tolga Aytug, M. Parans Paranthaman, Neil R. Taylor, Mi-Hee Ji, Ivan I. Kravchenko, Lei Cao
Publikováno v:
IEEE Transactions on Power Electronics. 36:41-44
Large-size vertical β -Ga2O3 Schottky barrier diodes (SBDs) with various device areas were demonstrated on a Si-doped n -type drift layer grown by hydride vapor phase epitaxy (HVPE) on bulk Sn-doped (001) n -type β -Ga2O3 substrate. In this letter,
Autor:
Jeomoh Kim, Yuanzheng Zhu, Russell D. Dupuis, Mi-Hee Ji, Theeradetch Detchprohm, Shyh-Chiang Shen
Publikováno v:
IEEE Photonics Technology Letters. 30:181-184
Front-illuminated GaN-based separate absorption and multiplication (SAM) ultraviolet (UV) avalanche photodiodes (APDs) with various photon detection areas are demonstrated grown by metalorganic chemical vapor deposition on bulk GaN native substrates
Autor:
L. S. Pan, Lei Cao, Pooran Chandra Joshi, Tolga Aytug, M. Parans Paranthaman, Mi-Hee Ji, Praneeth Kandlakunta, Neil R. Taylor, Ivan I. Kravchenko
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 1013:165664
The Schottky barrier diodes were fabricated from a bulk Sn-doped (001) n-type Ga 2O3 substrate with a Si-doped epitaxial layer grown by hydride vapor phase epitaxy (HVPE), which demonstrate a good response to X-rays. Circular metal contacts with diam
Autor:
Theeradetch Detchprohm, Russell D. Dupuis, Edward Letts, Mi-Hee Ji, Chuan-Wei Tsou, Shyh-Chiang Shen, Marzieh Bakhtiary-Noodeh, Tadao Hashimoto, Daryl Key
Publikováno v:
Materials, Vol 12, Iss 12, p 1925 (2019)
Materials
Volume 12
Issue 12
Materials
Volume 12
Issue 12
Free-standing gallium nitride (GaN) substrates are in high demand for power devices, laser diodes, and high-power light emitting diodes (LEDs). SixPoint Materials Inc. has begun producing 2&rdquo
GaN substrates through our proprietary Near Equil
GaN substrates through our proprietary Near Equil
Autor:
Ashok K. Sood, Shyh-Chiang Shen, Marzieh Bakhtiary-Noodeh, Russell D. Dupuis, Sachidananda Babu, Nibir K. Dhar, Theeradetch Detchprohm, Jay Lewis, P. Parminder Ghuman, Hoon Jeong, Mi-Hee Ji
Publikováno v:
Gallium Nitride Materials and Devices XIV.
Front-illuminated GaN p-i-p-i-n separate-absorption and multiplication avalanche photodiode (SAM-APD) epitaxial structures were grown by metalorganic chemical vapor deposition (MOCVD) on n-type bulk GaN substrates and fabricated into 4×4 arrays with
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 989:164961
Electrical characterization of several 4H-SiC Schottky diodes with Aerosol-Jet printed gold (Au), silver (Ag), and platinum (Pt) contacts was performed using forward and reverse current–voltage (IV) measurements. From these measurements, device par
Autor:
Ashok K. Sood, Jeomoh Kim, Russell D. Dupuis, Jay Lewis, Mi-Hee Ji, Nibir K. Dhar, Theeradetch Detchprohm
Publikováno v:
IEEE Photonics Technology Letters. 28:2015-2018
GaN p-i-n ultraviolet avalanche photodiodes (UV-APDs) were fabricated from epitaxial structures grown on low-dislocation-density free-standing GaN substrates to form $4\times 4$ UV-APD arrays with a device size of $75\times 75~\mu \text{m}^{{ {2}}}$