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pro vyhledávání: '"Metelka, Ondřej"'
Autor:
Metelka, Ondřej
The task of master’s thesis was to perform optimalization process for preparing metal etching mask by electron beam litography and subsequent selective wet ething of silicon with crystalographic orientation (100). Further characterization of etched
Externí odkaz:
http://www.nusl.cz/ntk/nusl-231496
