Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Mensi MD"'
Autor:
Gonzalo Salazar de Pablo, MD, Filippo Besana, MD, Vincenzo Arienti, MD, Ana Catalan, MD, PhD, Julio Vaquerizo-Serrano, MD, Anna Cabras, MD, Joana Pereira, MD, Livia Soardo, MD, Francesco Coronelli, MD, Simi Kaur, MSc, Josette da Silva, MSc, Dominic Oliver, PhD, Natalia Petros, PhD, Carmen Moreno, MD, PhD, Ana Gonzalez-Pinto, MD, PhD, Covadonga M Díaz-Caneja, MD, PhD, Jae Il Shin, MD, PhD, Pierluigi Politi, MD, PhD, Marco Solmi, MD, PhD, Renato Borgatti, MD, PhD, Martina Maria Mensi, MD, PhD, Celso Arango, MD, PhD, Christoph U Correll, MD, Philip McGuire, MD, PhD, FRCPsych, FMedSci, Paolo Fusar-Poli, MD, PhD
Publikováno v:
EClinicalMedicine, Vol 36, Iss , Pp 100909- (2021)
ABSTRACT: Background: Little is known about clinical outcomes other than transition to psychosis in people at Clinical High-Risk for psychosis (CHR-P). Our aim was to comprehensively meta-analytically evaluate for the first time a wide range of clini
Externí odkaz:
https://doaj.org/article/7ee3c7e55b114ba0be69cf428b07ac74
Autor:
Ferriday TB; Department of Engineering, University of Agder, Jon Lilletuns vei 9, Grimstad, 4879 Agder, Norway.; Group of Energy Materials, Swiss Federal Institute of Technology, Lausanne, Rue de l'Industrie 17, Sion, 1951 Valais, Switzerland., Nuggehalli Sampathkumar S; Department of Engineering, University of Agder, Jon Lilletuns vei 9, Grimstad, 4879 Agder, Norway.; Group of Energy Materials, Swiss Federal Institute of Technology, Lausanne, Rue de l'Industrie 17, Sion, 1951 Valais, Switzerland., Mensi MD; X-Ray Diffraction and Surface Analytics Facility, Swiss Federal Institute of Technology, Lausanne, Rue de l'Industrie 17, Sion, 1951 Valais, Switzerland., Middleton PH; Department of Engineering, University of Agder, Jon Lilletuns vei 9, Grimstad, 4879 Agder, Norway.; Group of Energy Materials, Swiss Federal Institute of Technology, Lausanne, Rue de l'Industrie 17, Sion, 1951 Valais, Switzerland., Van Herle J; Department of Engineering, University of Agder, Jon Lilletuns vei 9, Grimstad, 4879 Agder, Norway.; Group of Energy Materials, Swiss Federal Institute of Technology, Lausanne, Rue de l'Industrie 17, Sion, 1951 Valais, Switzerland., Kolhe ML; Department of Engineering, University of Agder, Jon Lilletuns vei 9, Grimstad, 4879 Agder, Norway.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2024 Jun 12; Vol. 16 (23), pp. 29963-29978. Date of Electronic Publication: 2024 May 29.
Autor:
Artuk K; École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering (IEM), Photovoltaics and Thin-Film Electronics Laboratory (PV-Lab), Rue de la Maladière 71b, Neuchâtel, 2002, Switzerland., Turkay D; École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering (IEM), Photovoltaics and Thin-Film Electronics Laboratory (PV-Lab), Rue de la Maladière 71b, Neuchâtel, 2002, Switzerland., Mensi MD; École Polytechnique Fédérale de Lausanne (EPFL-VS), Institute of Chemical Sciences and Engineering (ISIC-XRDSAP), Rue de L'Industrie 17, Sion, 1951, Switzerland., Steele JA; Australian Institute for Bioengineering and Nanotechnology (AIBN), The University of Queensland, Brisbane, QLD, 4072, Australia.; School of Mathematics and Physics, The University of Queensland, Brisbane, QLD, 4072, Australia., Jacobs DA; Centre Suisse d'Electronique et de Microtechnique (CSEM), Rue Jaquet-Droz 1, Neuchâtel, 2002, Switzerland., Othman M; École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering (IEM), Photovoltaics and Thin-Film Electronics Laboratory (PV-Lab), Rue de la Maladière 71b, Neuchâtel, 2002, Switzerland., Yu Chin X; Centre Suisse d'Electronique et de Microtechnique (CSEM), Rue Jaquet-Droz 1, Neuchâtel, 2002, Switzerland., Moon SJ; Centre Suisse d'Electronique et de Microtechnique (CSEM), Rue Jaquet-Droz 1, Neuchâtel, 2002, Switzerland., Tiwari AN; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstrasse 129, Duebendorf, 8600, Switzerland., Hessler-Wyser A; École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering (IEM), Photovoltaics and Thin-Film Electronics Laboratory (PV-Lab), Rue de la Maladière 71b, Neuchâtel, 2002, Switzerland., Jeangros Q; Centre Suisse d'Electronique et de Microtechnique (CSEM), Rue Jaquet-Droz 1, Neuchâtel, 2002, Switzerland., Ballif C; École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering (IEM), Photovoltaics and Thin-Film Electronics Laboratory (PV-Lab), Rue de la Maladière 71b, Neuchâtel, 2002, Switzerland.; Centre Suisse d'Electronique et de Microtechnique (CSEM), Rue Jaquet-Droz 1, Neuchâtel, 2002, Switzerland., Wolff CM; École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering (IEM), Photovoltaics and Thin-Film Electronics Laboratory (PV-Lab), Rue de la Maladière 71b, Neuchâtel, 2002, Switzerland.
Publikováno v:
Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2024 May; Vol. 36 (21), pp. e2311745. Date of Electronic Publication: 2024 Feb 19.
Autor:
Lee WT; Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland., van Muyden A; Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland., Bobbink FD; Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland., Mensi MD; Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland., Carullo JR; Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland., Dyson PJ; Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland. paul.dyson@epfl.ch.
Publikováno v:
Nature communications [Nat Commun] 2022 Aug 17; Vol. 13 (1), pp. 4850. Date of Electronic Publication: 2022 Aug 17.
Autor:
Su TS; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland.; Department of Chemical Engineering, National Tsing Hua University, Hsinchu 300, Taiwan., Eickemeyer FT; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland.; Laboratory of Photomolecular Science, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Hope MA; Laboratory of Magnetic Resonance, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Jahanbakhshi F; Laboratory of Computational Chemistry and Biochemistry, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Mladenović M; Laboratory of Computational Chemistry and Biochemistry, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Li J; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Zhou Z; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Mishra A; Laboratory of Magnetic Resonance, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Yum JH; Laboratory of Molecular Engineering of Optoelectronic Nanomaterials, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne 1015, Switzerland., Ren D; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Krishna A; Laboratory of Photomolecular Science, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Ouellette O; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Wei TC; Department of Chemical Engineering, National Tsing Hua University, Hsinchu 300, Taiwan., Zhou H; Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, United States., Huang HH; Materials Science Division and Center for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, United States., Mensi MD; Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Valais Wallis, CH-1951 Sion, Switzerland., Sivula K; Laboratory of Molecular Engineering of Optoelectronic Nanomaterials, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne 1015, Switzerland., Zakeeruddin SM; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Milić JV; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Hagfeldt A; Laboratory of Photomolecular Science, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Rothlisberger U; Laboratory of Computational Chemistry and Biochemistry, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Emsley L; Laboratory of Magnetic Resonance, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Zhang H; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland., Grätzel M; Laboratory of Photonics and Interfaces, École Polytechnique Fédérale de Lausanne, Lausanne 1015, Switzerland.
Publikováno v:
Journal of the American Chemical Society [J Am Chem Soc] 2020 Nov 25; Vol. 142 (47), pp. 19980-19991. Date of Electronic Publication: 2020 Nov 10.