Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Meng H. Lee"'
Publikováno v:
Bone & Joint Research, Vol 11, Iss 11, Pp 763-776 (2022)
AimsTissue inhibitors of metalloproteinases (TIMPs) are the endogenous inhibitors of the zinc-dependent matrix metalloproteinases (MMP) and A disintegrin and metalloproteinases (ADAM) involved in extracellular matrix modulation. The present study aim
Externí odkaz:
https://doaj.org/article/2574819263824b69b1969ae0f74eaf7b
Autor:
Katrina Rook, Ashish Kulkarni, Antonio Checco, Kenji Yamamoto, Russell Luberoff, Mario Roque, Stephen Lozowski, Joel Bahena, Marjorie Chee, Meng H. Lee
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af8fcf04b455ec83d64dcebdab7d8fc6
https://doi.org/10.1117/12.2641798
https://doi.org/10.1117/12.2641798
Autor:
Katrina Rook, JoJo Daof, Antonio Checco, Mohammad Saghayezhian, Kenji Yamamoto, Meng H. Lee, Marjorie Chee
Publikováno v:
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc8119ecf0bf97d2c27d5cf6a809c5e1
https://doi.org/10.1117/12.2642182
https://doi.org/10.1117/12.2642182
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
We present a comparison of the properties of the Mo/Si multilayers deposited by three techniques: secondary ion beam deposition (IBD), DC magnetron sputtering (MS), and biased-target ion beam deposition (BTIBD). Based on sputter simulations, we demon
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::abed86a5d8c291ced708281b2730ae32
https://doi.org/10.1117/12.2600972
https://doi.org/10.1117/12.2600972
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 20
The aim of our work is to investigate deposition conditions to further optimize the reflectivity of Mo/Si multilayers (MLs) for reflective coatings of extreme ultraviolet mask blanks. Dark-field transmission electron microscopy (TEM) measurements imp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8418fde09b03533f15e5e1e665616b3
https://doi.org/10.1117/1.jmm.20.2.021008
https://doi.org/10.1117/1.jmm.20.2.021008
Publikováno v:
Extreme Ultraviolet Lithography 2020.
We investigate the impact of key ion-beam-deposition (IBD) process conditions on the properties of Mo/Si multilayers as reflective coatings for Extreme Ultraviolet (EUV) mask blanks. Dark-field TEM measurements imply interfacial roughness values of 8
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c0016078a345a8d0cc5a726e36f35bf
https://doi.org/10.1117/12.2573164
https://doi.org/10.1117/12.2573164
Autor:
Thu Van Thi Nguyen, Sandeep Kohli, Tania Henry, Devlin Donnelly, Vincent Ip, Meng H. Lee, Frank Cerio, Katrina Rook, Kenji Yamamoto, Adrian J. Devahasayam, Narasimhan Srinivasan, Paul Turner
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2019.
As Extreme Ultra Violet lithography (EUVL) is becoming adopted into manufacturing, there is an ongoing need to identify and improve the EUV mask multilayer properties that impact reflectivity. Key properties include the roughness and inter-diffusion
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37f49303f72df7e35b1cfb2ed03e8531
https://doi.org/10.1117/12.2536935
https://doi.org/10.1117/12.2536935
Autor:
Meng H. Lee, Narasimhan Srinivasan, Katrina Rook, Sandeep Kohli, Vincent Ip, Frank Cerio, Adrian J. Devasahayam
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
For future nodes, TaN-based absorber layers on EUV mask-blanks, may need to be replaced with thinner layers of new material systems. Ni and Co based materials are promising material candidates owing to their high EUV absorption. Ion Beam Etching (IBE
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df40a09a2af97051e1f2d3a92bd1a6a5
https://doi.org/10.1117/12.2515098
https://doi.org/10.1117/12.2515098
Autor:
Vincent Ip, Sandeep Kohli, Frank Cerio, Meng H. Lee, Narasimhan Srinivasan, Adrian J. Devasahayam, Katrina Rook, Mathew S. Levoso
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
Development progress and roadmap, for high-reflective Mo/Si multilayers for EUV mask-blanks, are reviewed. We outline the state-of-the-art in low-defect-density secondary ion beam deposition (IBD), and ongoing hardware development for performance imp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5fd2158be3e0415f3dcc8256f5e2b661
https://doi.org/10.1117/12.2501832
https://doi.org/10.1117/12.2501832