Výsledky vyhledávání - "Melanie Cloutier"

Nickel pulse reversal plating for image reversal of ultrathin electron beam resist

Autor: David Turcotte, Lau Kien Mun, Yousef Awad, Eric Lavallee, Pan Yang, D. Drouin, Melanie Cloutier, Jacques Beauvais

Publikováno v: Thin Solid Films. 515:3040-3045

The effects of various pulse reversal plating parameters on the grain size and smoothness of Ni film on silver seed layers has been studied. The duty cycle, frequency, bath temperature and agitation methods have been tested. The objective was to form

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a4042eb8e9caba180608d54517c39870
https://doi.org/10.1016/j.tsf.2006.08.016

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Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists

Autor: Jacques Beauvais, Dominique Drouin, Melanie Cloutier, David Turcotte, Yousef Awad, Pan Yang, Pierre Lafrance, Eric Lavallee

Publikováno v: Japanese Journal of Applied Physics. 41:4122-4126

In order to meet the long term goals of the International Technology Roadmap for Semiconductors, it is important to demonstrate that X-ray masks can be fabricated at resolutions well below the 100 nm barrier. This paper presents results on the use of

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::985dee88fa06a7c10134754d4f6b7272
https://doi.org/10.1143/jjap.41.4122

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3D harnessing of light with photon cage

Autor: Guillaume Beaudin, Xavier Letartre, Pierre Viktorovitch, C. Sieutat, Pedro Rojo-Romeo, J. L. Leclercq, Philippe Regreny, Ségolène Callard, Geneviève Grenet, Vincent Aimez, K. Naji, Dominique Drouin, Melanie Cloutier, Michel Gendry

Publikováno v: Proc. SPIE 7712, Nanophotonics III
SPIE Photonics Europe 2010
SPIE Photonics Europe 2010, Apr 2010, Bruxelles, Belgium. pp.77120E, ⟨10.1117/12.854428⟩

International audience; We report on design, simulation and fabrication of ultimate and compact 3D close-geometries optical microcavities. These are based on the extension of the so-called 2.5D nanophotonic approach where a quasi 3D control of the ph

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3a4dad37e163b9aa0219f295e92b5b91
https://hal.archives-ouvertes.fr/hal-00692495/file/PSI77120E.pdf

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Evaporated resist for the fabrication and replication of LEEPL mask

Autor: Eric Lavallee, Hiroshi Nozue, Yousef Awad, Pan Yang, David Turcotte, Lau Kien Mun, Pierre Lafrance, R. Legario, Akira Yoshida, Melanie Cloutier, Jacques Beauvais, Dominique Drouin

Publikováno v: SPIE Proceedings.

Masks for low energy electron proximity projection lithography (LEEPL) require thin membranes, which in turn make the development of low-distortion masks a critical issue for this technology. By using an evaporated resist, a flip side fabrication pro

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6be2c2f0e913d17c358e07e2a243a6df
https://doi.org/10.1117/12.535747

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Nano patterning on optical fiber and laser diode facet with dry resist

Autor: Prasad Kelkar, Pan Yang, Lau Kien Mun, Eric Lavallee, Jacques Beauvais, Dominique Drouin, R. Legario, Yousef Awad, Melanie Cloutier, Vincent Aimez, David Turcotte

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:743

Semiconductor micro and nanofabrication lithography techniques for application in microelectronics as well as in micromechanics and optoelectronics can gain significantly from using a dry resist process, since it enables the deposition of a very unif

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::75c47ac1196eb24c58b0f78045387a50
https://doi.org/10.1116/1.1667503

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Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating

Autor: Prasad Kelkar, Kien Mun Lau, Melanie Cloutier, Jacques Beauvais, Eric Lavallee, Pan Yang, Yousef Awad, Dominique Drouin, David Turcotte

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1040

A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask formed by nickel pulse reversal plating to

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d2d1f7703316028c24c59386990d4364
https://doi.org/10.1116/1.1647589

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