EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility

Autor: Bekman, H.H.P.T., Dekker, M.F., Ebeling, R.P., Janssen, J.P.B., Koster, N.B., Meijlink, J.R., Molkenboer, F.T., Nicolai, K., Putten, M. van, Rijnsent, C.G.J., Storm, A.J., Stortelder, J.K., Wu, C.C., Zanger, R.M.S. de

Publikováno v: Proceedings International Conference on Extreme Ultraviolet Lithography 2019, SPIE Photomask Technology + EUV Lithography, 2019, Monterey, CA, USA, 11147

Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and install

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