Výsledky vyhledávání - "Meeusen, G.J."

The Physics of Plasma Jets Used for Fast Atomic Deposition

Autor: Schram, D.C., Beulens, J.J., Buuron, A.J.M., Kroesen, G.M.W., Meeusen, G.J., Wilbers, A.T.M., Milojevic, D., Vallinga, P.M.

Publikováno v: Plasma Jets in the Development of New Materials Technology ISBN: 9780429070938
High temperature plasma jets in the processes of treatment of materials : international workshop, September 1990, Frunze, USSR, 1-11
STARTPAGE=1;ENDPAGE=11;TITLE=High temperature plasma jets in the processes of treatment of materials : international workshop, September 1990, Frunze, USSR

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bec092a80da9422236b57443051eb523
https://doi.org/10.1201/9780429070938-59

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Fast plasma deposition with the thermal plasma expansion technique

Autor: Sanden, van de, M.C.M., Schram, D.C., Gielen, J.W.A.M., Buuron, A.J.M., Meeusen, G.J., Severens, R.J.

Publikováno v: Proceedings of the eighth Gaseous Electronics Meeting, February 7-10, 1994, Canberra, Australia

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::5ae8b5f133c7eae07f3a3b0ff76c81e7
https://research.tue.nl/nl/publications/2b9edb5b-dca3-4f8a-9fee-1007784701cb

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Expanding cascaded arc plasma beam deposition of a-Si:H for photovoltaic cells

Autor: Severens, R.J., van de Sanden, M.C.M., Brussaard, G.J.H., Schaepkens, M., Meeusen, G.J., Schram, D.C.

Publikováno v: ESCAMPIG 94 : European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, 12th, Noordwijkerhout, The Netherlands, August 23-26, 1994: Abstracts of invited lectures and contributed papers, 386-387
STARTPAGE=386;ENDPAGE=387;TITLE=ESCAMPIG 94 : European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, 12th, Noordwijkerhout, The Netherlands, August 23-26, 1994

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::f78147debe3c9892fcb0fc974bb3e757
https://research.tue.nl/nl/publications/288fa859-9794-4662-b06f-af37fcf21a8a

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(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms

Autor: Beulens, J.J., Buuron, A.J.M., Meeusen, G.J., Sanden, van de, M.C.M., Schram, D.C., Bonizzoni, G., Hooke, W., Sindoni, E.

Publikováno v: Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero-Varenna, Italy, 2-11 September 1992, 391-404
STARTPAGE=391;ENDPAGE=404;TITLE=Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero-Varenna, Italy, 2-11 September 1992

A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plasma deposition the expanding thermal plasma beam is described. Also, applications of plasmas to Si etching is discussed. [on SciFinder (R)]

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::3c6732a94130fdc48d8a32a69a2196a5
https://research.tue.nl/nl/publications/fe878df7-62d8-4cd5-b54f-c10cf43c94a5

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Application of Langmuir probe diagnostic in cascade arc plasma enhanced deposition

Autor: Qing, Z., Sanden, van de, M.C.M., Otorbaev, D.K., Graaf, de, M.J., Meeusen, G.J., Buuron, A.J.M., Schram, D.C., Harry, J.E.

Publikováno v: ISPC ... : international symposium on plasma chemistry, 11th, Loughborough, England, August 22-27, 1993, vol. 4, 1374-1379
STARTPAGE=1374;ENDPAGE=1379;TITLE=ISPC ... : international symposium on plasma chemistry, 11th, Loughborough, England, August 22-27, 1993, vol. 4

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::77c40c0eb69d8c620dc36ea600479167
https://research.tue.nl/nl/publications/a7f8a13f-f4bd-4042-a917-219503104917

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Fast deposition of a-C:H and a-Si:H using an expanding thermal plasma beam

Autor: Sanden, van de, M.C.M., Buuron, A.J.M., Gielen, J.W.A.M., Meeusen, G.J., Qian, Shengwei, Ooij, van, W.F., Schram, D.C., Ng, A.

Publikováno v: 1993 IEEE conference on plasma science : record abstracts

Summary form only given. A fast deposition method, utilizing a thermal plasma which expands into a vacuum vessel, has been used to deposit amorphous hydrogenated silicon and carbon layers (a-Si:H and a-C:H, respectively). The deposited layers are pro

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::75faaecb2a4cc58cdb607202db63ae78
https://research.tue.nl/nl/publications/68276c30-a31a-4373-bf42-fa64fb58eb9d

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Optical diagnostics for high electron density plasmas

Autor: Sanden, van de, M.C.M., Meulenbroeks, R.F.G., Beulens, J.J., Buuron, A.J.M., Graaf, de, M.J., Meeusen, G.J., Qing, Z., Regt, de, J.M., Dinescu, G., Otorbaev, D.K., Schram, D.C., Ferreira, C.M., Moisan, M.

Publikováno v: Microwave discharges : fundamentals and applications, 279-290
STARTPAGE=279;ENDPAGE=290;TITLE=Microwave discharges : fundamentals and applications

Nowadays high electron density plasmas are, beside their fundamental interest, widely used for many applications, e.g., light sources and plasma processing. The well known examples of high electron density plasmas can be found among the class of ther

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::1c33f16739f4a00b9b47f47eff8a727e
https://research.tue.nl/nl/publications/e742b315-995f-41ea-81c5-f8d414b1b7a7

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Spectral behavior of cascade arc plasma jet in Ar/H2/SiH4

Autor: Meeusen, G.J., Dinescu, G., Meulenbroeks, R.F.G., Sanden, van de, M.C.M., Schram, D.C., Harry, J.E.

Publikováno v: ISPC ... : international symposium on plasma chemistry, 11th, Loughborough, England, August 22-27, 1993, vol. 1, 350-355
STARTPAGE=350;ENDPAGE=355;TITLE=ISPC ... : international symposium on plasma chemistry, 11th, Loughborough, England, August 22-27, 1993, vol. 1

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::96a6ceefb8a22093396ca4bdfdac06d1
https://research.tue.nl/nl/publications/dcde5073-1633-428d-a935-e141d97cb9b9

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Fast deposition of amorphous hydrogenated silicon layers

Autor: Meeusen, G.J., Driessens, R.M.A., Sanden, van de, M.C.M., Schram, D.C.

Publikováno v: Proceedings 9th international colloquium on plasma processes, June 6-11, 1993, Antibes, Juan-les-Pins, France: papers, 99-101
STARTPAGE=99;ENDPAGE=101;TITLE=Proceedings 9th international colloquium on plasma processes, June 6-11, 1993, Antibes, Juan-les-Pins, France

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::997746ec00e3a67dd7761632787fd038
https://research.tue.nl/nl/publications/2de57c69-6df0-45e4-b4e0-4728ddcc4a98

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