Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Md. Nishanto Nahid Pishon"'
Publikováno v:
AIP Advances, Vol 7, Iss 5, Pp 055115-055115-7 (2017)
We report on the use of conventional non-Bosch, non-cryogenic Reactive Ion Etching (RIE) processing to produce a range of low optical reflection morphologies on silicon wafer. Tapered structures and nano dendritic-pillars are patterned into silicon o
Externí odkaz:
https://doaj.org/article/714492143d404a8d917d240eece04eaf
Publikováno v:
AIP Advances, Vol 7, Iss 5, Pp 055115-055115-7 (2017)
We report on the use of conventional non-Bosch, non-cryogenic Reactive Ion Etching (RIE) processing to produce a range of low optical reflection morphologies on silicon wafer. Tapered structures and nano dendritic-pillars are patterned into silicon o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::57bc963a5126caa6b340e64f8255ed86
https://doaj.org/article/714492143d404a8d917d240eece04eaf
https://doaj.org/article/714492143d404a8d917d240eece04eaf