ASCEND-Eye: Effects of Aspirin on Diabetic Retinopathy

Autor: Sammons, Emily, Bowman, Louise, Stevens, William, Buck, Georgina, Hammami, Imen, Parish, Sarah, Armitage, Jane, Collins, R., Armitage, J., Bowman, L., Parish, S., Peto, R., Barton, J., Simpson, D., Adler, A., Aung, T., Baigent, C., Bodansky, H.J., Farmer, A., Haynes, R., McPherson, R., Mafham, M., Neil, H.A.W., Samani, N., Sleight, P., Weissberg, P., Sandercock, P., Gerstein, H., Gray, R., Hennekens, C., Fletcher, L., Murphy, K., Hurley, S., Lee, R., Pickworth, S., Willett, M., Wincott, M., Sammons, E., Lay, M., Buck, G., Murawska, A., Stevens, W., Wallendszus, K., Young, A., Hammami, I., Melham, K., Brown, G., Latham-Mollart, J., Brewer, A., Scanlon, P., Patel, P., Olson, M., Kay, J., Banerjee, S., Evans, L., Davies, A., Griffiths, M., Clayton, H., Kirby, P., Pennington, M., Clarke, D., Anslow, J., Hallam, A., Witts, J., Egan, S., Wharton, A., Sachdev, A., Derbyshire, A., Williamson, E., Hepplestone, K., Mithra, S., Oliver, S., Wiatrak-Olszewska, P., Gazis, T., Alvey, K., Wu, E., Cook, H., Gregory, N., Parkinson, P., Anderson, J., Bolter, L., Maharajan, P., McFee, R., Allsop, L., Sowter, D., Hodgson, D., Thow, J., Featonby, J., Furnival, R., Lipinski, H., Benjamin, H., McAfee, T., Payne, E., Still, L., Sammons, Emily L., Bowman, Louise J., Stevens, William M.

Publikováno v: In Ophthalmology July 2024 131(7):771-779

Framework design for weight-average molecular weight control in semi-batch polymerization

Autor: Salas, S.D., Ghadipasha, N., Zhu, W., Mcafee, T., Zekoski, T., Reed, W.F., Romagnoli, J.A.

Publikováno v: In Control Engineering Practice September 2018 78:12-23

Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.

Reconstructing the three-dimensional latent image of extreme ultraviolet resists with resonant soft x-ray scattering

Autor: Freychet, G, Cordova, IA, McAfee, T, Kumar, D, Pandolfi, RJ, Anderson, C, Dhuey, SD, Naulleau, P, Wang, C, Hexemer, A

Publikováno v: Journal of Micro/Nanopatterning Materials and Metrology, vol 18, iss 2
Journal of Micro/ Nanolithography, MEMS, and MOEMS, vol 18, iss 2

Extreme ultraviolet (EUV) lithography is one of the most promising printing techniques for high-volume semiconductor manufacturing at the 14-nm half-pitch device node and beyond. However, key challenges around EUV photoresist materials, such as the e

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::3431604d4c499040dad7a4cbbe913dcd
https://escholarship.org/uc/item/2tx9f6b3

Online DEKF for State Estimation in Semi-Batch Free-Radical Polymerization Reactors

Autor: Salas, S.D., Ghadipasha, N., Zhu, W., Romagnoli, J.A., Mcafee, T., Reed, W.F.

Publikováno v: In Computer Aided Chemical Engineering 2017 40:1465-1470