Zobrazeno 1 - 10
of 54
pro vyhledávání: '"Mayank T. Bulsara"'
Performance of 1 eV GaNAsSb-based photovoltaic cell on Si substrate at different growth temperatures
Autor:
Soon Fatt Yoon, Prithu Sharma, Mayank T. Bulsara, Satrio Wicaksono, Kian Hua Tan, Wan Kai Loke, Nelvin Leong Yurong, Eugene A. Fitzgerald, Daosheng Li, Tim Milakovich
Publikováno v:
Progress in Photovoltaics: Research and Applications. 25:327-332
Autor:
Mayank T. Bulsara, Robert F. Karlicek, Shuuichi Koseki, Zhibo Guo, Toshiya Tabuchi, Collin Hitchcock, Yoshiki Yano, Guanxi Piao, T. Paul Chow, Koh Matsumoto
Publikováno v:
physica status solidi (a). 217:2070026
Autor:
Prithu Sharma, Soon Fatt Yoon, Satrio Wicaksono, Nelvin Leong, Kian Hua Tan, Mayank T. Bulsara, Daosheng Li, Tim Milakovich, Gene Fitzgerald, Wan Khai Loke
Publikováno v:
Progress in Photovoltaics: Research and Applications. 24:340-347
We report the performance of 1-eV GaNAsSb-based photovoltaic samples grown on a Si substrate using molecular beam epitaxy at different As/Ga beam equivalent pressure (BEP) ratios. The light current–voltage curve and spectral response of the samples
Autor:
Sabina Abdul Hadi, Sueda Saylan, Mayank T. Bulsara, Ammar Nayfeh, Marcus S. Dahlem, Tim Milakovich, Eugene A. Fitzgerald
Publikováno v:
IEEE Journal of Photovoltaics. 5:425-431
Single-layer antireflective coating (SLARC) materials and design for GaAs1_xPx/Si tandem cells were analyzed by TCAD simulation. We have shown that optimum SLARC thickness is a function of bandgap, thickness, and material quality of top GaAs 1-x P x
Autor:
Angelo Mascarenhas, Mayank T. Bulsara, Kunal Mukherjee, Daniel A. Beaton, Eugene A. Fitzgerald
Publikováno v:
Journal of Crystal Growth. 392:74-80
Strain fields arising from a non-uniform distribution of misfit dislocations in an underlying compositionally graded buffer are shown to be sufficiently strong to modify indium incorporation in III-phosphide light emitting layers. Composition fluctua
Publikováno v:
ECS Transactions. 50:333-337
High quality epitaxial growth of GaAsP on SiGe templates would allow access to materials and band gaps that would enable novel, high performance devices on Si. However, GaAsP/SiGe interface engineering has proved to be very complex. In this paper, we
Publikováno v:
ECS Journal of Solid State Science and Technology. 2:P324-P331
Integration of III-V compound (III-V) semiconductors with Si complementary metal-oxide semiconductor (CMOS) has been an area of great interest because of the circuit performance enhancement that can be gained by placing Si and III-V devices in close
Publikováno v:
Journal of Crystal Growth. 324:103-109
Two approaches for metalorganic chemical vapor deposition (MOCVD)-grown compositionally graded metamorphic buffers on 6° offcut bulk GaAs were investigated. The first approach consisted of tandem graded layers of InGaAs and InGaP with compositional
Publikováno v:
ECS Transactions. 35:225-229
Si CMOS-based contact metallurgies to III-V compounds will allow parallel interconnection of Si CMOS and III-V devices and promote monolithic integration. In this study, we report the use of nickel silicides to contact n++ GaAs encapsulated with n++
Publikováno v:
Journal of The Electrochemical Society. 159:H183-H190
Front end integration of III-V compound semiconductor devices with Si complimentary metal-oxide-semiconductor (CMOS) technology requires the development of commercially viable engineered substrates. The fabrication of engineered substrates currently