EUV Focus Sensor: Design and Modeling

Autor: Maureen E. Teyssier, Kenneth A. Goldberg, J. Alexander Liddle

Publikováno v: Goldberg, Kenneth A.; Teyssier, Maureen E.; & Liddle, J. Alexander. (2005). EUV Focus Sensor: Design and Modeling. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/4b10v2dp

We describe performance modeling and design optimization of a prototype EUV focus sensor (FS) designed for use with existing 0.3-NA EUV projection-lithography tools. At 0.3-NA and 13.5-nm wavelength, the depth of focus shrinks to 150 nm increasing th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cddb44bdb3f37aa1fcdb424e8661f572
http://www.escholarship.org/uc/item/4b10v2dp