Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Mattia Pasquali"'
Autor:
Jayant Kumar Lodha, Johan Meersschaut, Mattia Pasquali, Hans Billington, Stefan De Gendt, Silvia Armini
Publikováno v:
Nanomaterials, Vol 14, Iss 14, p 1212 (2024)
Area selective deposition (ASD) is a promising IC fabrication technique to address misalignment issues arising in a top–down litho-etch patterning approach. ASD can enable resist tone inversion and bottom–up metallization, such as via prefill. It
Externí odkaz:
https://doaj.org/article/d374829ce6a642008ae8a7e78a14e887
Autor:
Mattia Pasquali, Anita Brady-Boyd, Alicja Leśniewska, Patrick Carolan, Thierry Conard, Robert O’Connor, Stefan De Gendt, Silvia Armini
Publikováno v:
ACS Applied Materials & Interfaces. 15:6079-6091
Autor:
Mattia Pasquali, Patrick Carolan, Stefanie Sergeant, Johan Meersschaut, Valentina Spampinato, Thierry Conard, Alessandro Viva, Stefan De Gendt, Silvia Armini
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d1b995b950842857bae129784722356d
https://hdl.handle.net/20.500.11769/559944
https://hdl.handle.net/20.500.11769/559944
Publikováno v:
ECS Transactions. 92:25-32
To enable the downscaling of Integrated Circuit (IC) components accordingly to Moore’s law, novel nano-patterning techniques and materials are essential. Self-Aligned patterning schemes, such as Area Selective Deposition (ASD), are receiving increa
Publikováno v:
ECS Meeting Abstracts. :867-867
Autor:
Isabelle Sagnes, Jeremy Da Fonseca, E. Ghegin, Christophe Jany, Mattia Pasquali, Vincent Delaye, Philippe Rodriguez, Tiphaine Card, János L. Lábár, Fabrice Nemouchi
Publikováno v:
IEEE Transactions on Electron Devices. 64:4408-4414
In the context of the development of silicon photonics, various Ti- and Ni-based alloyed metallizations have been investigated for the purpose of forming low resistivity and Si CMOS-compatible contacts to n-InP. The innovative Ni2P metallization comb
Publikováno v:
Applied Surface Science. 540:148307
Atomic layer deposition (ALD) combined with self-assembled monolayer (SAM) passivation allows selective deposition on patterned substrates at the nanoscale, enabling bottom-up material fabrication for various applications. Selective chemisorption of