Zobrazeno 1 - 10
of 124
pro vyhledávání: '"Matti Putkonen"'
Autor:
Paloma Ruiz Kärkkäinen, Georgi Popov, Timo Hatanpää, Antti Kemppinen, Katja Kohopää, Mohammad Bagheri, Hannu‐Pekka Komsa, Mikko Heikkilä, Kenichiro Mizohata, Mykhailo Chundak, Petro Deminskyi, Anton Vihervaara, Mário Ribeiro, Joel Hätinen, Joonas Govenius, Matti Putkonen, Mikko Ritala
Publikováno v:
Advanced Materials Interfaces, Vol 11, Iss 26, Pp n/a-n/a (2024)
Abstract The development of deposition processes for metal carbide thin films is rapidly advancing, driven by their potential for applications including catalysis, batteries, and semiconductor devices. Within this landscape, atomic layer deposition (
Externí odkaz:
https://doaj.org/article/ad29c00f170c431f87c2eb643717cca5
Publikováno v:
ACS Omega, Vol 9, Iss 1, Pp 1670-1682 (2023)
Externí odkaz:
https://doaj.org/article/7083dda9589b478ca70b30164149d86a
Autor:
Xinzhi Li, Marko Vehkamäki, Mykhailo Chundak, Kenichiro Mizohata, Anton Vihervaara, Markku Leskelä, Matti Putkonen, Mikko Ritala
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 18, Pp n/a-n/a (2023)
Abstract This paper presents preparation of boron‐doped Al2O3 thin films by atomic layer deposition (ALD) using phenylboronic acid (PBA) and trimethylaluminum (TMA) as precursors. Deposition temperatures of 160–300 °C are studied, giving a maxim
Externí odkaz:
https://doaj.org/article/fa8a24ac350e4037885909bda389a47c
Autor:
Saba Ghafourisaleh, Marko Vehkamäki, Anton Vihervaara, Chao Zhang, Mikko J. Heikkilä, Markku Leskelä, Matti Putkonen, Mikko Ritala
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 7, Pp n/a-n/a (2023)
Abstract In this paper, the deposition of pyrrone thin film materials by molecular layer deposition (MLD) is reported for the first time using pyromellitic dianhydride (PMDA) and 3,3'‐diaminobenzidine (DAB) as monomers, and ozone as a promoting pre
Externí odkaz:
https://doaj.org/article/e8a5f8232fd84c6f8c73612f3e4d624d
Publikováno v:
ACS Omega, Vol 7, Iss 9, Pp 7725-7736 (2022)
Externí odkaz:
https://doaj.org/article/01aa5f195c9444ee9a38cddec66b8868
Publikováno v:
ACS Omega, Vol 6, Iss 27, Pp 17545-17554 (2021)
Externí odkaz:
https://doaj.org/article/73eef9b953534c7cadbf3d5420afa2cc
Autor:
Laura Keskiväli, Matti Putkonen, Eini Puhakka, Eija Kenttä, Jeroen Kint, Ranjith K. Ramachandran, Christophe Detavernier, Pekka Simell
Publikováno v:
ACS Omega, Vol 3, Iss 7, Pp 7141-7149 (2018)
Externí odkaz:
https://doaj.org/article/2d7500c22c044e929d02f0336b2fba21
Autor:
Niko Heikkinen, Juha Lehtonen, Laura Keskiväli, Jihong Yim, Shwetha Shetty, Yanling Ge, Matti Reinikainen, Matti Putkonen
Publikováno v:
Heikkinen, N, Lehtonen, J, Keskiväli, L, Yim, J, Shetty, S, Ge, Y, Reinikainen, M & Putkonen, M 2022, ' Modelling atomic layer deposition overcoating formation on a porous heterogeneous catalyst ', Physical Chemistry Chemical Physics, vol. 24, no. 34, pp. 20506-20516 . https://doi.org/10.1039/d2cp02491h
Publisher Copyright: © 2022 The Royal Society of Chemistry. Atomic layer deposition (ALD) was used to deposit a protective overcoating (Al2O3) on an industrially relevant Co-based Fischer-Tropsch catalyst. A trimethylaluminium/water (TMA/H2O) ALD pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::23a0dbe4acc9ba415acba1758a92cfaa
https://doi.org/10.1039/d2cp02491h
https://doi.org/10.1039/d2cp02491h
Autor:
Matti Putkonen, Tekla Tammelin, Maarit Karppinen, Chao Zhang, Patrick E. Hopkins, Marie Gestranius, Ramin Ghiyasi, Panagiotis Spiliopoulos, John A. Tomko, Kai Arstila, Eero Kontturi
Publikováno v:
Spiliopoulos, P, Gestranius, M, Zhang, C, Ghiyasi, R, Tomko, J, Arstila, K, Putkonen, M, Hopkins, P E, Karppinen, M, Tammelin, T & Kontturi, E 2022, ' Cellulose-inorganic hybrids of strongly reduced thermal conductivity ', Cellulose, vol. 29, pp. 8151-8163 . https://doi.org/10.1007/s10570-022-04768-3
The employment of atomic layer deposition and spin coating techniques for preparing inorganic-organic hybrid multilayer structures of alternating ZnO-CNC layers was explored in this study. Helium ion microscopy and X-ray reflectivity showed the super
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3645a436582115f356fa196b9f9f5791
https://doi.org/10.1007/s10570-022-04768-3
https://doi.org/10.1007/s10570-022-04768-3
Autor:
Jihong Yim, Eero Haimi, Miia Mäntymäki, Vile Kärkäs, René Bes, Aitor Arandia Gutierrez, Kristoffer Meinander, Philipp Brüner, Thomas Grehl, Lars Gell, Tiia Viinikainen, Karoliina Honkala, Simo Huotari, Reetta Karinen, Matti Putkonen, Riikka L. Puurunen
The self-terminating chemistry of atomic layer deposition (ALD) ideally enables the growth of homogeneously distributed materials on an atomic scale. This study investigates the ALD of zinc oxide (ZnO) on mesoporous zirconium oxide (ZrO2) using zinc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b53c150e71971382152a91e55e9f1f44
https://doi.org/10.26434/chemrxiv-2023-x72qv
https://doi.org/10.26434/chemrxiv-2023-x72qv
