Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Matthias Mohaupt"'
Autor:
Uwe D. Zeitner, Markus Erhard, Gehard Huber, Yann Gerome, Andreas Gebhardt, Henrik von Lukowicz, Matthias Mohaupt, Gerd Harnisch, Stefan Risse, Thomas Peschel, Uwe Hübner, Thomas Bolz
Publikováno v:
International Conference on Space Optics — ICSO 2020.
The high precision Slit Assembly is a key component of the FLEX instrument. Two different input beams for the Low- and the High-resolution spectrometer, respectively, will be generated by the Slit assembly. The paper presents design and implementatio
Publikováno v:
International Conference on Space Optics — ICSO 2008.
In the frame of the initiative for Global Monitoring for Environment and Security (GMES), jointly undertaken by the European Commission and the European Space Agency a technological development of two filter assemblies was performed for the Multi- Sp
Publikováno v:
International Conference on Space Optics — ICSO 2016.
The sentinel–4 spectrometer´s slits are the key components of the ultraviolet–visible (UV–VIS) and the near infrared (NIR) channels for earth observation, with absolute slit width accuracy and variation required as < 0.1 ?m, respectively, and
Autor:
Marcel Hornaff, Thomas Burkhardt, Andreas Tünnermann, Klaus Reimer, Erik Beckert, M. Witt, B. Zaage, H. J. Döring, M. Slodowski, Ramona Eberhardt, Matthias Mohaupt
Publikováno v:
International Symposium on Microelectronics. 2011:000600-000607
Multi-Shaped electron beam lithography is considered a promising approach for high throughput mask and direct writing. Providing multiple apertures and individually controlled electrodes it allows for massive parallelization of exposure shots, thus s
Autor:
R. Eberhardt, Christoph Damm, C. Brandstätter, Andreas Tünnermann, E. Haugeneder, Matthias Mohaupt, Thomas Peschel, H. J. Döring
Publikováno v:
Microelectronic Engineering. 83:980-983
Mask-less lithography becomes more and more important to reduce cycle time and lithography costs for device prototyping and small batch ASIC manufacturing. A European consortium is developing an electron multi beam technology - called projection mask
Autor:
Hans-Georg Meyer, Andreas Ihring, Daniel Hagedorn, Matthias Mohaupt, Karl Dietrich Bunte, Christian Herbst, Torsten Fichna, Frank Haenschke, E. Kessler
Publikováno v:
SPIE Proceedings.
As manmade space debris in the low earth orbit becomes an increasing risk to space missions, which could even result in total mission loss, it has become even more critical to have detailed knowledge of the properties of these particles like the mass
Autor:
Erik Beckert, Christoph Damm, Klaus Reimer, Thomas Burkhardt, Ramona Eberhardt, Matthias Mohaupt, Hans-Joachim Döring, Marcel Hornaff, Andreas Tünnermann
Publikováno v:
IFIP Advances in Information and Communication Technology
6th International Precision Assembly Seminar (IPAS)
6th International Precision Assembly Seminar (IPAS), Feb 2012, Chamonix, France. pp.42-50, ⟨10.1007/978-3-642-28163-1_6⟩
Precision Assembly Technologies and Systems ISBN: 9783642281624
IPAS
6th International Precision Assembly Seminar (IPAS)
6th International Precision Assembly Seminar (IPAS), Feb 2012, Chamonix, France. pp.42-50, ⟨10.1007/978-3-642-28163-1_6⟩
Precision Assembly Technologies and Systems ISBN: 9783642281624
IPAS
Part 1: Micro Assembly Processes and Systems; International audience; Multi shaped beam lithography requires the precise and durable alignment and fixation of MEMS based Multi Deflection Arrays on stable ceramic system platforms using vacuum and high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3a10ce474ad1117ff3ed31b6f4edea2c
https://hal.inria.fr/hal-01363878/document
https://hal.inria.fr/hal-01363878/document
Autor:
Ramona Eberhardt, Stefan Risse, Marcel Hornaff, Christoph Schenk, Christoph Damm, Ingo Schmidt, Hans-Joachim Döring, Andreas Kamm, Thomas Elster, Matthias Mohaupt, Roland Ramm, Ulf Carsten Kirschstein, Gunther Notni, Peter Kühmstedt
The fast and precise deflection of electron-beams is mandatory for common electron beam tools and next generation multi-beam lithography systems. Electrostatic fields generated by an arrangement of electrodes with several electric potentials are used
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e104278f7d8d10e43629c2b2c31a7517
https://publica.fraunhofer.de/handle/publica/229056
https://publica.fraunhofer.de/handle/publica/229056
Publikováno v:
Design, Test, Integration, and Packaging of MEMS/MOEMS 2002.
Technical challenges and directions for microoptical and optoelectronical packaging include the development of special handling tools for manual and automated assembly stations. These tools not only have to be precise, but also reliable in a mass pro