Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Matthias M, Minjauw"'
Autor:
Youssef Hamdaoui, Sofie S. T. Vandenbroucke, Sondre Michler, Katir Ziouche, Matthias M. Minjauw, Christophe Detavernier, Farid Medjdoub
Publikováno v:
Micromachines, Vol 15, Iss 9, p 1157 (2024)
In the framework of fully vertical GaN-on-Silicon device technology development, we report on the optimization of non-alloyed ohmic contacts on the N-polar n+-doped GaN face backside layer. This evaluation is made possible by using patterned TLMs (Tr
Externí odkaz:
https://doaj.org/article/71885d60057c4c42ac01fad618bb5f13
Autor:
Nithin Poonkottil, Eduardo Solano, Arbresha Muriqi, Matthias M. Minjauw, Matthias Filez, Michael Nolan, Christophe Detavernier, Jolien Dendooven
Publikováno v:
CHEMISTRY OF MATERIALS
Nanoscale patterning of inorganics is crucial for the fabrication of advanced electronic, photonic, and energy devices. The emerging sequential infiltration synthesis (SIS) method fabricates nanofeatures by block-selective vapor-phase growth in block
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ee201677991ad138c355a69e004dce0b
https://doi.org/10.1021/acs.chemmater.2c01866
https://doi.org/10.1021/acs.chemmater.2c01866
Autor:
Jolien Dendooven, Ranjith K. Ramachandran, Eduardo Solano, Mert Kurttepeli, Lisa Geerts, Gino Heremans, Jan Rongé, Matthias M. Minjauw, Thomas Dobbelaere, Kilian Devloo-Casier, Johan A. Martens, André Vantomme, Sara Bals, Giuseppe Portale, Alessandro Coati, Christophe Detavernier
Publikováno v:
Nature Communications, Vol 8, Iss 1, Pp 1-12 (2017)
The performance of supported nanoparticle catalysts is closely related to their size, shape and interparticle distance. Here, the authors introduce an atomic layer deposition-based strategy to independently tune the size and coverage of platinum nano
Externí odkaz:
https://doaj.org/article/4f37fa4483664702a4c1a9b902fa3b95
Autor:
Nithin Poonkottil, Matthias M. Minjauw, Andreas Werbrouck, Stefano Checchia, Eduardo Solano, Mikko Nisula, Alexis Franquet, Christophe Detavernier, Jolien Dendooven
Publikováno v:
CHEMISTRY OF MATERIALS
Atomic layer deposition (ALD) of ruthenium dioxide (RuO2) thin films using metalorganic precursors and O-2 can be challenging because the O-2 dose needs to be precisely tuned and significant nucleation delays are often observed. Here, we present a lo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7af65f6b61fb79907bc265104f074891
https://doi.org/10.1021/acs.chemmater.2c02292
https://doi.org/10.1021/acs.chemmater.2c02292
Autor:
Matthias Filez, Ji-Yu Feng, Matthias M. Minjauw, Eduardo Solano, Nithin Poonkottil, Michiel Van Daele, Ranjith K. Ramachandran, Chen Li, Sara Bals, Hilde Poelman, Christophe Detavernier, Jolien Dendooven
Publikováno v:
CHEMISTRY OF MATERIALS
Atomic layer deposition (ALD) typically employs metal precursor and co-reactant pulses to deposit thin films in a layer-by-layer fashion. While conventional ABAB-type ALD sequences implement only two functionalities, namely a metal source and ligand
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5880b3bf23ac25dec07f879978c9676d
https://doi.org/10.1021/acs.chemmater.2c01304
https://doi.org/10.1021/acs.chemmater.2c01304
Autor:
Juan Santo Domingo Peñaranda, Matthias M. Minjauw, Sofie S. T. Vandenbroucke, Robin Petit, Jin Li, Jolien Dendooven, Christophe Detavernier
Publikováno v:
Dalton Transactions.
The world of flexible devices has brought the interest to combine ALD and MLD films. However, direct ALD on MLD can suffer from stability/growth issues. Utilising O2 plasma, their compatibility can be enhanced, providing a more effective stacking.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbec6c26065d2150d83a417f5f147afc
https://doi.org/10.1039/d3dt00378g
https://doi.org/10.1039/d3dt00378g
Autor:
Juan, Santo Domingo Peñaranda, Mikko, Nisula, Sofie S T, Vandenbroucke, Matthias M, Minjauw, Jin, Li, Andreas, Werbrouck, Jonas, Keukelier, Andrea I, Pitillas Martínez, Jolien, Dendooven, Christophe, Detavernier
Publikováno v:
Dalton transactions (Cambridge, England : 2003). 50(4)
Alucones are one of the best-known films in the Molecular Layer Deposition (MLD) field. In this work, we prove that alucone/Al2O3 nanolaminate synthesis can be successfully performed by alternating alucone MLD growth with static O2 plasma exposures.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::8c65697b81b02c6ede617bca083e7a77
https://pubmed.ncbi.nlm.nih.gov/33351866
https://pubmed.ncbi.nlm.nih.gov/33351866
Autor:
Jan, Rongé, Thomas, Dobbelaere, Lowie, Henderick, Matthias M, Minjauw, Sreeprasanth Pulinthanathu, Sree, Jolien, Dendooven, Johan A, Martens, Christophe, Detavernier
Publikováno v:
Nanoscale advances. 1(10)
The development of active and stable earth-abundant catalysts for hydrogen and oxygen evolution is one of the requirements for successful production of solar fuels. Atomic Layer Deposition (ALD) is a proven technique for conformal coating of structur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::5abc01969deb7889ffbdcdef0339ab02
https://pubmed.ncbi.nlm.nih.gov/36132102
https://pubmed.ncbi.nlm.nih.gov/36132102
Autor:
Eduardo, Solano, Jolien, Dendooven, Matthias M, Minjauw, Ranjith K, Ramachandran, Kevin, Van de Kerckhove, Thomas, Dobbelaere, Daniel, Hermida-Merino, Christophe, Detavernier
Publikováno v:
Nanoscale. 9:13159-13170
Particle coarsening is the main cause for thermal deactivation and lifetime reduction of supported Pt nanocatalysts. Here, Atomic Layer Deposition (ALD) was used to prepare a model system of Pt nanoparticles with high control over the metal loading a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::96b72a4ea718c065b55f638a3c8e3d82
https://doi.org/10.1039/c7nr04278g
https://doi.org/10.1039/c7nr04278g
Autor:
Michiel Van Daele, Matthew B.E. Griffiths, Ali Raza, Matthias M. Minjauw, Eduardo Solano, Ji-Yu Feng, Ranjith K. Ramachandran, Stéphane Clemmen, Roel Baets, Seán T Barry, Christophe Detavernier, Jolien Dendooven
Publikováno v:
ECS Meeting Abstracts. :1156-1156
Currently only two Au ALD processes exist, using two different precursors. The first Au ALD process, reported by Griffiths et al. [1], is a three step process using Me3AuPMe3 as the precursor in combination with an oxygen plasma and water vapour as t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3a1418e5863d9373f71f1dd478f0a25
https://doi.org/10.1149/ma2019-02/24/1156
https://doi.org/10.1149/ma2019-02/24/1156