Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Matthew I. Egbe"'
Autor:
John C. Warner, Ramdas P. Pai, Matthew I. Egbe, J. M. Grasshoff, Donna J. Guarrera, C. M. Cheng, Lloyd D. Taylor
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 33:2515-2519
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07a7c26ec499d3f2569c4e19f4c2564d
https://doi.org/10.1002/pola.1995.080331425
https://doi.org/10.1002/pola.1995.080331425
Publikováno v:
Spectroscopy Letters. 25:1333-1339
The structure of the product from the successive reaction of pyridinium 2-benzamido-5-chloro-4-methylbenzenesulfonate with PCl5 and excess anhydrous hydrazine has been established as 8-chloro-4-phenyl-7-methyl-2,3-dihydro-1,2,3,5-benzothiatriazine-1,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7600ddae7a5109ea2bd0251e32b67290
https://doi.org/10.1080/00387019208017867
https://doi.org/10.1080/00387019208017867
Autor:
Donald W. Johnson, Ngalula C. Bukasa, Lin Lin, Yasuhiro Suzuki, Yihua Liao, Cindy X. Chen, Matthew I. Egbe
Publikováno v:
Advances in Resist Technology and Processing XIV.
Exposures leading to 0.18 micrometer or better resolution are now being demanded by IC development. Photolithography using 193 nm exposure tools is the leading technology for the development of these next generation of devices. We are reporting on ou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50c343f117c324bbf97faf946a8dd2de
https://doi.org/10.1117/12.275900
https://doi.org/10.1117/12.275900