Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Matthew D. Christianson"'
Autor:
Yanshan Gao, Matthew D. Christianson, Yang Wang, Marc P. Coons, Jiazhen Chen, Jialong Zhang, Steve Marshall, Tracy L. Lohr, Jerzy Klosin, Tobin J. Marks
Publikováno v:
ACS Catalysis. 12:7589-7597
Autor:
Glenn H. Fredrickson, Nicolas J. Treat, Edward J. Kramer, Phillip D. Hustad, Yingdong Luo, Damien Montarnal, Matthew D. Christianson, Craig J. Hawker
Publikováno v:
ACS Macro Letters
ACS Macro Letters, Washington, D.C : American Chemical Society, 2015, 4 (12), pp.1332--1336
ACS Macro Letters, Washington, D.C : American Chemical Society, 2015, 4 (12), pp.1332--1336
In addition to the traditional parameters of chi (χ) and degree of polymerization (N), we demonstrate that the segregation strength of a diblock copolymer can be increased by introduction of an ionic unit at the junction of the two blocks. Compared
Autor:
Yang Wang, Matthew D. Christianson, Tobin J. Marks, Tracy L. Lohr, Jiazhen Chen, Yanshan Gao, Steve Marshall, Jerzy Klosin
Publikováno v:
Journal of the American Chemical Society. 141(19)
Recent decades have witnessed intense research efforts aimed at developing new homogeneous olefin polymerization catalysts, with a primary focus on metal-Cl or metal-hydrocarbyl precursors. Curiously, metal-NR2 precursors have received far less atten
Autor:
Daniel J. Arriola, Clark R. Landis, D. Luke Nelsen, Matthew D. Christianson, Bernie J. Anding, Julie L. Sawicki
Publikováno v:
ACS Catalysis. 6:7398-7408
Chromophore-containing quench agents 2 and 3 enable quantitative active site counting and determination of the mass distribution of active catalyst polymeryls by refractive index (RI) and UV detected gel permeation chromatography (GPC) for the polyme
Autor:
Weichao Shi, Damien Montarnal, Craig J. Hawker, Glenn H. Fredrickson, Yingdong Luo, Christian W. Pester, Edward J. Kramer, Matthew D. Christianson, Katherine P. Barteau, Phillip D. Hustad, Sangwon Kim
Publikováno v:
Macromolecules. 48:3422-3430
We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimi
Autor:
Michael Wagner, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Jin Wuk Sung, Matthew D. Christianson, Su-Jin Kang, Vipul Jain, Daniel J. Arriola, Suzanne Coley
Publikováno v:
Journal of Photopolymer Science and Technology. 24:179-183
This paper discusses the continued evolution of Polymer-bound PAG [PBP] resists for sub-20nm lithography. Utilizing EUV wavelength, there has been enough progress in resolution and sensitivity to justify the use of these materials. PBP resists have s
Publikováno v:
Concepts in Magnetic Resonance Part A. :165-183
Application of NMR spectroscopy to fast irreversible reactions (t1/2 < 0.7 s) has been hampered by limitations in instrumentation and general methods for modeling the complicated spectra that result. Analytical descriptions of nuclear spin dynamics d
Autor:
Chien-Yang Chiu, Javier Read de Alaniz, John W. Kramer, Nicolas J. Treat, Matthew D. Christianson, Brett P. Fors, Craig J. Hawker
Publikováno v:
Treat, NJ; Fors, BP; Kramer, JW; Christianson, M; Chiu, CY; Alaniz, JRD; et al.(2014). Controlled radical polymerization of acrylates regulated by visible light. ACS Macro Letters, 3(6), 580-584. doi: 10.1021/mz500242a. UC Santa Barbara: Retrieved from: http://www.escholarship.org/uc/item/4m30p2mk
ACS Macro Letters, vol 3, iss 6
ACS macro letters, vol 3, iss 6
ACS Macro Letters, vol 3, iss 6
ACS macro letters, vol 3, iss 6
The controlled radical polymerization of a variety of acrylate monomers is reported using an Ir-catalyzed visible light mediated process leading to well-defined homo-, random, and block copolymers. The polymerizations could be efficiently activated a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::de309d365bc71d4766cce13db560af63
http://www.escholarship.org/uc/item/4m30p2mk
http://www.escholarship.org/uc/item/4m30p2mk
Publikováno v:
SPIE Proceedings.
Highly sensitive EUV photoresists remain a critical challenge to enable high volume manufacturing with EUV lithography. Chemically amplified resists continue to provide the best sensitivity for EUV photoresists, but the high EUV transparency of most
Autor:
Michael Wagner, James F. Cameron, David Valeri, Amy Kwok, Matthew D. Christianson, Matthew M. Meyer, Suzanne Coley, Jim Thackeray, Owendi Ongayi
Publikováno v:
SPIE Proceedings.
Resolution, line edge roughness, sensitivity and low outgassing are the key focus points for extreme ultraviolet (EUV) resist materials. Sensitivity has become increasingly important so as to address throughput concerns in device manufacturing and co