Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Matthew C. Carlson"'
Autor:
Dustin W. Janes, Christopher M. Bates, Lane Austin, C. Grant Willson, Christopher J. Ellison, Michael J. Maher, Matthew C. Carlson, Gregory Blachut, Jeffrey L. Self, William J. Durand
Publikováno v:
ACS macro letters. 3(8)
Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::96be623e6f33cace894938dfea05c16f
https://pubmed.ncbi.nlm.nih.gov/35590708
https://pubmed.ncbi.nlm.nih.gov/35590708
Autor:
Matthew C. Carlson, Daniel F. Sunday, Charles T. Rettner, Philip Liu, Ji Yeon Kim, Joy Cheng, R. Joseph Kline, C. Grant Willson, Christopher J. Ellison, Michael J. Maher, Nathaniel A. Lynd, Carlos R. Baiz, Gregory Blachut, Christopher M. Bates, Yusuke Asano, Devon H. Callan, Daniel P. Sanders
Publikováno v:
ACS Applied Materials & Interfaces. 12:23399-23409
Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dafa2852bcdd134d468e8d27338836bb
https://doi.org/10.1021/acsami.0c02997
https://doi.org/10.1021/acsami.0c02997
Autor:
Deji Akinwande, Maruthi N. Yogeesh, Wei Li, Helen Wong, Stephen M. Sirard, Sunshine X. Zhou, Tao Huang, Christopher J. Ellison, Reika Katsumata, Matthew C. Carlson, Richard D. Piner, Michael J. Maher, Zilong Wu, Alvin L. Lee
Publikováno v:
Polymer. 110:131-138
Patterning graphene into nanoribbons (graphene nanoribbons, GNR) allows for tunability in the emerging fields of plasmonic devices in the mid-infrared and terahertz regime. However, the fabrication processes of GNR arrays for plasmonic devices often
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7943a3e77f93ed64be604c34d5531051
https://doi.org/10.1016/j.polymer.2016.12.034
https://doi.org/10.1016/j.polymer.2016.12.034
Autor:
Michael J. Maher, Christopher J. Ellison, Matthew C. Carlson, Daniel F. Sunday, R. Joseph Kline, C. Grant Willson, Summer Tein
Publikováno v:
ACS Macro Letters. 5:1306-1311
Block copolymers (BCPs) have the potential to play a key role in templating materials for nanoscale synthesis. BCP lithography likely will be one of the first examples of BCP-based nanomanufacturing implemented in a production setting. One of the cha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::76247005430296d73514118044576146
https://doi.org/10.1021/acsmacrolett.6b00684
https://doi.org/10.1021/acsmacrolett.6b00684
Autor:
Matthew C. Carlson, Christopher J. Ellison, William J. Durand, Logan J. Santos, Gregory Blachut, Michael J. Maher, C. Grant Willson, Summer Tein, Venkat Ganesan
Publikováno v:
Macromolecules. 49:308-316
Use of block copolymer thin films in lithographic applications requires orientation of domains perpendicular to a substrate. Algebraic models were used to predict conditions that are favorable for perpendicular versus parallel domain orientation in f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::58e4fcee1c8fd70dd621acf574dced3b
https://doi.org/10.1021/acs.macromol.5b02262
https://doi.org/10.1021/acs.macromol.5b02262
Autor:
C. Grant Willson, Gregory Blachut, Matthew C. Carlson, Daniel P. Sanders, Charles T. Rettner, Michael J. Maher, William J. Durand, Christopher J. Ellison, Joy Cheng, Christopher M. Bates
Publikováno v:
ACS Applied Materials & Interfaces. 7:3323-3328
The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS–PTMSS, L0 = 22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-ep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f8b4faacd99f29bc9406a1fca37131f5
https://doi.org/10.1021/am508197k
https://doi.org/10.1021/am508197k
Autor:
Stephen M. Sirard, Christopher M. Bates, C. Grant Willson, Summer Tein, Lane Austin, Sunshine X. Zhou, William J. Durand, Yusuke Asano, Christopher J. Ellison, Gregory Blachut, Matthew C. Carlson, Michael J. Maher
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 53:344-352
This report describes the design and synthesis of a series of lamella-forming, silicon-containing block copolymers (Si-BCPs) and evaluation of these materials as potential candidates for lithographic applications. The interaction parameter χ of each
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9206452bbe04e93edaa901b58f4da1df
https://doi.org/10.1002/pola.27370
https://doi.org/10.1002/pola.27370
Autor:
Michael J. Maher, Jeffrey L. Self, William J. Durand, Gregory Blachut, C. Grant Willson, Julia D. Cushen, Colin O. Hayes, Leon M. Dean, Christopher J. Ellison, Matthew C. Carlson, Stephen M. Sirard, Christopher M. Bates
Publikováno v:
Chemistry of Materials. 26:1471-1479
Top coat design, coating, and optimization methodologies are introduced that facilitate the synthesis, application, and identification of neutral top coats for block copolymer (BP) thin films. Polymeric top coat composition, controlled via synthesis,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fc9e13d4fc16f90128a4c1b45a16955
https://doi.org/10.1021/cm403813q
https://doi.org/10.1021/cm403813q
Autor:
Gregory Blachut, Christopher J. Ellison, William J. Durand, Lane Austin, C. Grant Willson, Matthew C. Carlson, Jeffrey L. Self, Colin O. Hayes, Yusuke Asano, Stephen M. Sirard, Christopher M. Bates, Michael J. Maher
Publikováno v:
Journal of Photopolymer Science and Technology. 27:415-418
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86e1507dde3294be8fc65537da803559
https://doi.org/10.2494/photopolymer.27.415
https://doi.org/10.2494/photopolymer.27.415
Autor:
Jeffrey R. Strahan, Michael J. Maher, Emir Gurer, Kazunori Mori, C. Grant Willson, Christopher J. Ellison, Gregory Blachut, William J. Durand, Stephen M. Sirard, Christopher M. Bates, Matthew C. Carlson, Lane Austin, Andrew M. Dinhobl
Tin-containing block copolymers were investigated as materials for nanolithographic applications. Poly(4-trimethylstannylstyrene-block-styrene) (PSnS-PS) and poly(4-trimethylstannylstyrene-block-4-methoxystyrene) (PSnS-PMOST) synthesized by reversibl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fcb3616613ac86af037c985fd7e49051
https://resolver.caltech.edu/CaltechAUTHORS:20160415-113745200
https://resolver.caltech.edu/CaltechAUTHORS:20160415-113745200
