Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Matt Lassiter"'
Autor:
Wei Wu, Matt Lassiter, Chris Progler, Jonathan L. Cobb, Lloyd C. Litt, Young-Mog Ham, Will Conley, Kevin Lucas, Mike Cangemi, Bernie Roman, Marc Cangemi, Bryan S. Kasprowicz, Rand Cottle, Nicolo Morgana
Publikováno v:
SPIE Proceedings.
Today novel RET solutions are gaining more and more attention from the lithography community that is facing new challenges in attempting to meet the new requirement of the SIA roadmap. Immersion, high NA, polarization, and mask topography, are becomi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0dfafea430c136f931ea857f690adbdf
https://doi.org/10.1117/12.659390
https://doi.org/10.1117/12.659390
Autor:
Will Conley, Nicoló Morgana, Bryan S. Kasprowicz, Mike Cangemi, Matt Lassiter, Lloyd C. Litt, Marc Cangemi, Rand Cottle, Wei Wu, Jonathan Cobb, Young-Mog Ham, Kevin Lucas, Bernie Roman, Chris Progler
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a30f9a7b9886caeef72765bd6cda0f7
https://doi.org/10.1117/12.659353
https://doi.org/10.1117/12.659353
Publikováno v:
SPIE Proceedings.
Intensity imbalance between the 0 and π phase features of c:PSM cause gate CD control and edge placement problems. Strategies such as undercut, selective biasing, and combinations of undercut and bias are currently used in production to mitigate the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d23a759104f7effd0c47c2bc1633bc1e
https://doi.org/10.1117/12.632214
https://doi.org/10.1117/12.632214
Autor:
Chris Progler, Young-Mog Ham, Wei Wu, Mark Smith, Lloyd C. Litt, Mike Cangemi, Rusty Carter, Rand Cottle, Bernie Roman, Jonathan L. Cobb, Kevin Lucas, Bryan S. Kasprowicz, Will Conley, Marc Cangemi, Matt Lassiter
Publikováno v:
Optical Microlithography XVIII.
The lithography prognosticator of the early 1980"s declared the end of optics for sub-0.5μm imaging. However, significant improvements in optics, photoresist and mask technology continued through the mercury lamp lines (436, 405 & 365nm) and into la
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c89af5aa9e78836a00842ac2b95879c9
https://doi.org/10.1117/12.601584
https://doi.org/10.1117/12.601584