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pro vyhledávání: '"Matt L. Chin"'
Autor:
Matt L. Chin, Sina Najmaei, Chinedu Ekuma, Katherine M. Price, Madan Dubey, Peter M. Wilson, James Hone, Theanne Schiros
Publikováno v:
Journal of Materials Chemistry C. 9:17437-17443
The ALD process of deposition of ultrathin high-κ HfO2 on chlorinate graphene.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02400e74e29585490d315e31542927bc
https://doi.org/10.1039/d1tc03502a
https://doi.org/10.1039/d1tc03502a
