Zobrazeno 1 - 10
of 87
pro vyhledávání: '"Massimo Gentili"'
Publikováno v:
Fontes Artis Musicae. 64:367-383
English Abstract: Claudio Sartori (1913–1994) remains a unique figure within the history of musical heritage in the twentieth century. A musicologist, bibliographer, cataloguer, theatre critic, he demonstrated an unquestionable talent for writing.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e4881954abe5736fc8324389b37c9a9
https://doi.org/10.1353/fam.2017.0042
https://doi.org/10.1353/fam.2017.0042
Autor:
Tedeschi, Massimo Gentili
Publikováno v:
Il Flauto dolce, 1983 Jan 01(9), 34-36.
Externí odkaz:
https://www.jstor.org/stable/41700241
Autor:
Sergio Doneda, Romano Morson, Maria Chiara Ubaldi, Anna Donghi, Alessandro Nottola, Umberto Colombo, Stefano Sardo, G. Mutinati, Melissa Di Muri, F. Giacometti, Massimo Gentili
Publikováno v:
Microelectronic Engineering. 85:1210-1213
In this paper a strategy for the reduction of the line edge roughness (LER) of silicon-on-insulator (SOI) waveguides is presented. SOI technology is particularly attractive for next generation integrated optical components thanks to the very high ind
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64cd3bf427f5db28b82d98b938b59e6f
https://doi.org/10.1016/j.mee.2008.01.035
https://doi.org/10.1016/j.mee.2008.01.035
Autor:
Massimo Gentili-Tedeschi
This case study on cataloging notated music focuses on music presentation format, and the use of controlled vocabularies in a multilingual context, when concepts do not have corresponding terms in one or more languages, and when common language terms
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0c1f1f740e0b9a2bf38a8c0a77dd580f
Autor:
S. Cabrini, Massimo Gentili, Q. Leonard, E. Di Fabrizio, L. Mastrogiacomo, A. Nottola, Annamaria Gerardino
Publikováno v:
Microelectronic Engineering. 53:599-602
X-ray lithography has several advantages over optical or e-beam techniques, since x-ray proximity printing can overcome typical limitations of such techniques, enabling the imaging of ultra thick resist layers (micro-mechanical application). In this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f9402276c0ea83c12a69e55c8d60c6d
https://doi.org/10.1016/s0167-9317(00)00387-7
https://doi.org/10.1016/s0167-9317(00)00387-7
Autor:
Efim Gluskin, Zhonghou Cai, Barry P. Lai, Massimo Gentili, Zheng Chen, Franco Cerrina, W. Yun, E. Di Fabrizio, Azalia A. Krasnoperova
Publikováno v:
Review of Scientific Instruments. 70:3537-3541
A linear and a circular zone plate with a blazed zone profile (ZPBP) have been fabricated and characterized using synchrotron x rays. The ZPBPs have significantly improved performances in terms of focusing efficiency and the background near the focus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f227f3097f140cf2eb0c1d16bf0d7999
https://doi.org/10.1063/1.1149956
https://doi.org/10.1063/1.1149956
Autor:
E. Di Fabrizio, Azalia A. Krasnoperova, Yuli Vladimirsky, Zhonghou Cai, W. Yun, Franco Cerrina, Jörg Maser, Barry P. Lai, Daniel Legnini, Massimo Gentili, Efim Gluskin, Zheng Chen
Publikováno v:
Review of Scientific Instruments. 70:2238-2241
Focusing of 8 keV x rays to a spot size of 150 and 90 nm full width at half maximum have been demonstrated at the first- and third-order foci, respectively, of a phase zone plate (PZP). The PZP has a numerical aperture of 1.5 mrad and focusing effici
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::646f6839493426f7ecc33203dc94e216
https://doi.org/10.1063/1.1149744
https://doi.org/10.1063/1.1149744
Autor:
Massimo Gentili, Ioannis Raptis, Zheng Cui, E. DiFabrizio, George P. Patsis, P. Prewett, G. Meneghini, Nikos Glezos, Anja Rosenbusch, B. Nowotny
Publikováno v:
Microelectronic Engineering. 46:379-382
A fast simulator for e-beam lithography called SELID, is presented. For the exposure part, an analytical solution based on the Boltzmann transport equation is used instead of Monte Carlo. All-important phenomena (backscattering, generation of seconda
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7727ca331e87584905a9e06e4aefefa
https://doi.org/10.1016/s0167-9317(99)00111-2
https://doi.org/10.1016/s0167-9317(99)00111-2
Publikováno v:
Surface Review and Letters. :265-286
X-ray photoelectron spectroscopy has become a true microscopic technique at third generation soft X-ray synchrotron sources, finding applications in many domains of academic and applied research. This paper describes the present status of scanning ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30ba2849129b52a516999e2f0a79eae1
https://doi.org/10.1142/s0218625x99000287
https://doi.org/10.1142/s0218625x99000287
Publikováno v:
Scopus-Elsevier
ELETTRA is a third generation synchrotron radiation source. The energy spectrum allows the design of beamlines suitable for x-ray lithography from soft to hard x-ray wavelengths. An appropriate lithographic window for micro- and nanofabrication can b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4088955734bb41ff60825c3fecd62933
https://doi.org/10.1063/1.1149640
https://doi.org/10.1063/1.1149640