Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Massiel Cristina Cisneros-Morales"'
Publikováno v:
APL Materials, Vol 1, Iss 2, Pp 022108-022108 (2013)
Hafnon (HfSiO4) as it is initially formed in a partially demixed film of hafnium titanate (HfTiO4) on fused SiO2 is studied by atomic number (Z) contrast high resolution scanning electron microscopy, x-ray diffraction, and Raman spectroscopy and micr
Externí odkaz:
https://doaj.org/article/0c0e93be6aa741eab4f841ce32608601
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 28:1161-1168
Nanolaminate films with a nominal 5 nm HfO2–4 nm TiO2 bilayer architecture are sputter deposited on unheated fused silica and Au-coated glass substrates. Films on fused silica are postdeposition annealed from 573 to 1273 K and characterized by x-ra
Publikováno v:
APL Materials, Vol 1, Iss 2, Pp 022108-022108 (2013)
Hafnon (HfSiO4) as it is initially formed in a partially demixed film of hafnium titanate (HfTiO4) on fused SiO2 is studied by atomic number (Z) contrast high resolution scanning electron microscopy, x-ray diffraction, and Raman spectroscopy and micr
Publikováno v:
Journal of Applied Physics. 111:109904
Continued investigation of hafnia-titania nanolaminates on silica substrates after long term annealing shows that hafnon (HfSiO4) is formed, in addition to the previously reported phases. Here, a 293 nm-thick stack of 5 nm HfO2-4 nm TiO2 bilayers (0.
Publikováno v:
Journal of Applied Physics. 109:123523
Hf-rich hafnia-titania nanolaminate films with five HfO2-TiO2 bilayer architectures (0.64 to 0.94 Hf atom fraction) were sputter deposited on unheated fused silica substrates, annealed post-deposition from 573 to 1273 K, and analyzed by x-ray diffrac
Publikováno v:
Applied Physics Letters. 98:051909
Orthorhombic (o) HfTiO4 is crystallized when sputter deposited hafnia-titania nanolaminates with ultrathin layers and bilayer (HfO2)0.5(TiO2)0.5 composition are annealed between 573 and 1173 K. However, o-HfTiO4 demixes after annealing at 1273 K, a r
Publikováno v:
Journal of Applied Physics. 108:123506
The onset of the fundamental optical absorption edge in sputter deposited HfO2–TiO2 nanolaminate films grown on unheated substrates was investigated. Three bilayer architectures were examined, representing overall film chemistry from 0.51 to 0.72 a