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pro vyhledávání: '"Mask data preparation"'
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Publikováno v:
IEEE Access, Vol 7, Pp 24192-24203 (2019)
Mask data preparation (MDP) is a part of the mask data process for fabricating semiconductors, and its importance has commonly been neglected. This paper proposes an integer linear programming model and two meta-heuristics, a genetic algorithm (GA) a
Externí odkaz:
https://doaj.org/article/ce4ec72f8ff646d1882fb497e2f977a9
Autor:
Patrick Quéméré, Jérôme Vaillant, Sébastien Bérard-Bergery, Pierre Chevalier, Charlotte Beylier, Jean-Baptist Henry
Publikováno v:
Journal of Microelectromechanical Systems. 30:442-455
Grayscale mask creation has for the most part been restricted to over-simplified optical and resist models usually based on a contrast curve approach. While this technique has proven to work for microstructures of large dimensions (ten to hundreds of
Publikováno v:
IEEE Access, Vol 7, Pp 24192-24203 (2019)
Mask data preparation (MDP) is a part of the mask data process for fabricating semiconductors, and its importance has commonly been neglected. This paper proposes an integer linear programming model and two meta-heuristics, a genetic algorithm (GA) a
Autor:
Vlad Liubich, Mary Zuo, Peter Buck, Ingo Bork, Bhardwaj Durvasula, Nageswara S. V. Rao, Rachit Sharma
Publikováno v:
Photomask Technology 2021.
Photomask technology has advanced substantially with the introduction of Multi Beam Mask Writers (MBMW), which achieve acceptable mask write times even with very complex mask patterns. In addition, Inverse Lithography Technology (ILT) and similar tec
Publikováno v:
Photomask Technology 2021.
As the semiconductor manufacturing industry moves towards advanced nodes with increasingly complex designs, users may experience an enormous increase in runtimes of mask data processing steps. This is true for Mask Process Correction (MPC)/Mask Data
Autor:
Keisuke Mizuuchi, Isabella Kim, Alexander Tritchkov, Xima Zhang, Ashutosh Rathi, Vlad Liubich, John L. Sturtevant
Publikováno v:
Photomask Technology 2021.
The patterning requirements of next generation lithographic processes and the desire to keep manufacturing costs down have pushed the lithographers to explore the advantages of the curvilinear masks. Multiple studies backed by the experimental result
Autor:
Sylvie Hurat
Publikováno v:
SPIE Exhibition Product Demonstrations: PUV 2020.
"This demonstration presents a fully automated mask set design environment, customized to easily integrate into a customer's existing MDP flow. It incorporates XYALIS production-proven software: - Barcode generation - Advanced frame generation - Mask
Autor:
Lu Sha, Ryan Pearman, Bo Su, Linyong Pang, Michael Pomerantsev, Ali Bouaricha, Kechang Wang, Mariusz Niewczas, P. Jeffrey Ungar, Aki Fujimura
Publikováno v:
Optical Microlithography XXXIII.
Since its introduction more than a decade ago, inverse lithography technology (ILT) has been seen as a promising solution to many of the challenges of advanced-node lithography. Numerous studies have demonstrated that curvilinear ILT mask shapes prod
Publikováno v:
Photomask Technology 2019.
Silicon Photonics design layouts require use of curved shapes, since many of the structures built to route light through silicon are designed to curve smoothly to minimize the loss of signal strength. The design-to-silicon flow involves steps like De