Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Masayuki Izawa"'
Autor:
Masayoshi Ishikawa, Ryo Yumiba, Masanori Ouchi, Hiroyuki Shindo, Shinichi Shinoda, Yasutaka Toyoda, Masayuki Izawa
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
In the drive toward sub-10-nm semiconductor devices, manufacturers have been developing advanced lithography technologies such as extreme ultraviolet lithography and multiple patterning. However, these technologies can cause unexpected defects, and a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dd567516b6ccea9fa697b8cac1c4b68
https://doi.org/10.1117/12.2551456
https://doi.org/10.1117/12.2551456
Autor:
Shizuru Yamada, Koichiro Matsuo, Tadashi Ogasawara, Masayuki Izawa, Yuji Masuda, Tsuyoshi Yamada
Publikováno v:
Geriatrics & Gerontology International. 17:2171-2177
Aim When eating food that contains both liquid and solid phases, the liquid component frequently enters the hypopharynx before swallowing and can increase the risk of aspiration. Thus, we examined whether the initial viscosity of mixed consistency fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::572d2e79c4e7aa3ffee240d9f659243f
https://doi.org/10.1111/ggi.13056
https://doi.org/10.1111/ggi.13056
Autor:
Masayoshi Ishikawa, Yasutaka Toyoda, Hiroyuki Shindo, Ryou Yumiba, Masanori Ouchi, Masayuki Izawa, Shinichi Shinoda, Dou Shuyang
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
With the miniaturization of devices, hot spot evaluation of a wide area of a wafer for small change points such as wafer topology is required. DBM (Design Based Metrology) is an effective method for evaluating systematic defects of multiple patternin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4bd92c35095a5d3b11e21d37ccbb728e
https://doi.org/10.1117/12.2514921
https://doi.org/10.1117/12.2514921
Autor:
Shigetoshi Sakimura, Masayuki Izawa, Shinichi Shinoda, Yasutaka Toyoda, Hiroyuki Shindo, Ryo Yumiba, Masayoshi Ishikawa
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
With the miniaturization of devices, hot spots caused by wafer topology are becoming a problem in addition to hot spots resulting from design, mask and wafer process, and hot spot evaluation of a wide area in a chip is becoming required. Although DBM
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a23f0f7d55beabb728afb5bb2a28d2d
https://doi.org/10.1117/12.2514898
https://doi.org/10.1117/12.2514898
Deep learning's impact on contour extraction for Design Based Metrology and Design Based Inspection.
Autor:
Ryo Yumiba, Masayoshi Ishikawa, Shinichi Shinoda, Shigetoshi Sakimura, Yasutaka Toyoda, Hiroyuki Shindo, Masayuki Izawa
Publikováno v:
Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-9, 9p
Autor:
Shuyang Dou, Shinichi Shinoda, Masayoshi Ishikawa, Ryo Yumiba, Shigetoshi Sakimura, Masanori Ouchi, Yasutaka Toyoda, Hiroyuki Shindo, Masayuki Izawa
Publikováno v:
Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-8, 8p
Autor:
Tsuyoshi, Yamada, Koichiro, Matsuo, Masayuki, Izawa, Shizuru, Yamada, Yuji, Masuda, Tadashi, Ogasawara
Publikováno v:
Geriatricsgerontology international. 17(11)
When eating food that contains both liquid and solid phases, the liquid component frequently enters the hypopharynx before swallowing and can increase the risk of aspiration. Thus, we examined whether the initial viscosity of mixed consistency food c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::44610c811b9879316548798c9d8dbac0
https://pubmed.ncbi.nlm.nih.gov/28425188
https://pubmed.ncbi.nlm.nih.gov/28425188
Autor:
Jeroen Van de Kerkhove, Hiroyuki Shindo, Hideo Sakai, Hitoshi Sugahara, Daisuke Fuchimoto, Peter De Bisschop, Masayuki Izawa
Publikováno v:
SPIE Proceedings.
We have succeeded in quantifying changes in 2D pattern shape, which are induced by exposure condition and Optical Proximity Correction (OPC), from CD-SEM image. In the current lithography technology, micro patterns which are close to resolution limit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80fd3208e4130704097ad3132f8d4747
https://doi.org/10.1117/12.2012661
https://doi.org/10.1117/12.2012661
Autor:
J. F. Lin, Jia-Rui Hu, Masayuki Izawa, Mingyi Hsu, Yuji Enomoto, Daisuke Hibino, Hiroyuki Shindo
Publikováno v:
SPIE Proceedings.
The impact on yield loss due to systematic defect which remains after Optical Proximity Correction (OPC) modeling has increased, and achieving an acceptable yield has become more difficult in the leading technology beyond 20 nm node production. Furth
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::326ecb8f8235b8894b089a679a8d3599
https://doi.org/10.1117/12.2010780
https://doi.org/10.1117/12.2010780
Publikováno v:
Journal of the Institute of Brewing. 102:183-189
To eliminate the influence of maltose, ethanol, low molecular weight β-glucan and an inhibitor of the calcofluor fluorescence reaction in wort and beer on the measured values of a calcofluor-FIA, a post-column calcofluor-FIA method has been develope
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b598ef025bfbac5413ff41b54ca7cd08
https://doi.org/10.1002/j.2050-0416.1996.tb00907.x
https://doi.org/10.1002/j.2050-0416.1996.tb00907.x