Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Masayuki Iwasa"'
Publikováno v:
Journal of Thermal Analysis and Calorimetry. 123:1841-1846
The distribution of carbon black (CB) nanoparticles in natural rubber/polybutadiene (NR/BR) blend was evaluated by DSC and AFM. The restriction of BR due to the interaction between BR and CB was smaller than that of NR from the glass transition behav
Publikováno v:
Journal of Thermal Analysis and Calorimetry. 123:1825-1831
Phase transition behaviors and morphology of thin crystals of 1-heptadecanol and 1-octadecanol with sample masses from 3 μg to 1 mg were investigated by the high-sensitive DSC and AFM. The solid transition and the melting temperatures depressed with
Autor:
Masayuki Iwasa
Publikováno v:
Journal of The Adhesion Society of Japan. 51:177-182
Publikováno v:
Netsu Bussei. 26:203-208
Autor:
Makoto Okada, Masayuki Iwasa, Yuichi Haruyama, Shinji Matsui, Ken-ichiro Nakamatsu, Kazuhiro Kanda
Publikováno v:
Microelectronic Engineering. 86:657-660
In nanoimprint lithography (NIL), a mold is coated with an antisticking layer for preventing resin from adhering to it. A fluorinated self-assembled monolayer (F-SAM) is mainly used as the antisticking layer. The temperature of the mold in thermal NI
Publikováno v:
Materials Science and Engineering: A. :679-682
Long carbon fibers with 3.5, 4.5, 5.0 and 5.5 GPa in average tensile stress-reinforced epoxy laminates have been studied to clarify the bending fatigue behavior and fracture mechanism of advanced carbon-fiber reinforced plastic composites. Bending fa
Autor:
Makoto Okada, Ken-ichiro Nakamatsu, Yuichi Haruyama, Masayuki Iwasa, Shinji Matsui, Kazuhiro Kanda
Publikováno v:
Microelectronic Engineering. 86:673-675
A fluorinated self-assembled monolayer (F-SAM) is mainly used as the antisticking layer. To prevent the F-SAM coated on the nanoimprint lithography (NIL) mold from deteriorating, we propose a new form of nanoimprinting using a release-agent-coated re
Autor:
Kazuhiro Kanda, Masayuki Iwasa, Shinji Matsui, Makoto Okada, Ken-ichiro Nakamatsu, Yuji Kang, Yuichi Haruyama
Publikováno v:
Journal of Photopolymer Science and Technology. 22:167-169
Autor:
Yamada Noriko, Ken-ichiro Nakamatsu, Masayuki Iwasa, Yuichi Haruyama, Makoto Okada, Shinji Matsui, Kazuhiro Kanda
Publikováno v:
Japanese Journal of Applied Physics. 47:7467-7469
In nanoimprint lithography (NIL), molds are in direct contact with replication materials. Furthermore, the glass transition temperature is around 100–200 °C in thermal NIL. We examined the temperature dependence of a release effect for the antisti
Autor:
Yuichi Haruyama, Yamada Noriko, Kazuhiro Kanda, Shinji Matsui, Ken-ichiro Nakamatsu, Masayuki Iwasa, Makoto Okada
Publikováno v:
Journal of Photopolymer Science and Technology. 21:597-599