Zobrazeno 1 - 10
of 566
pro vyhledávání: '"Masayoshi Umeno"'
Autor:
Rucheng Zhu, Yota Mabuchi, Riteshkumar Vishwakarma, Balaram Paudel Jaisi, Haibin Li, Masami Naito, Masayoshi Umeno, Tetsuo Soga
Publikováno v:
AIMS Materials Science, Vol 11, Iss 4, Pp 760-773 (2024)
In the realm of solid-state lithium-ion battery (SLIB) research, anode development remains a focal area because the interface between the solid electrolyte and the anode plays a critical role in determining battery performance. Among various anode ma
Externí odkaz:
https://doaj.org/article/f7253a782a25452594f3e3333eace17a
Autor:
Riteshkumar Vishwakarma, Rucheng Zhu, Amr Attia Abuelwafa, Yota Mabuchi, Sudip Adhikari, Susumu Ichimura, Tetsuo Soga, Masayoshi Umeno
Publikováno v:
ACS Omega, Vol 4, Iss 6, Pp 11263-11270 (2019)
Externí odkaz:
https://doaj.org/article/207437fc27ae43308022e6376eaf3ad0
Autor:
Rupesh Singh, Golap Kalita, Rakesh D. Mahyavanshi, Sudip Adhikari, Hideo Uchida, Masaki Tanemura, Masayoshi Umeno, Toshio Kawahara
Publikováno v:
AIP Advances, Vol 9, Iss 3, Pp 035043-035043-6 (2019)
Here, we report on the large-area synthesis of hBN layer at a comparatively lower temperature using ammonia borane as precursor by microwave assisted surface wave plasma (MW-SWP) chemical vapour deposition (CVD). The solid precursor was sublimed insi
Externí odkaz:
https://doaj.org/article/cf24d3ddd27d4cac9cb511c5898d030a
Autor:
Ajinkya G. Nene, Makoto Takahashi, Prakash R. Somani, Hare Ram Aryal, Koichi Wakita, Masayoshi Umeno
Publikováno v:
Carbon: Science and Technology, Vol 8, Iss 1, Pp 13-24 (2016)
Novel method to synthesize graphene-Fe3O4 nanocomposite is disclosed. Graphene functionalized with carboxylic group was added during the chemical synthesis of Fe3O4 nanoparticles by reduction of Fe(acac)3 using ascorbic acid to get graphene-Fe3O4 na
Externí odkaz:
https://doaj.org/article/30cade13aa01416789694615222818bc
Autor:
Golap Kalita, Masayoshi Umeno
Publikováno v:
AppliedChem. 2:160-184
Several kinds of chemical vapor deposition (CVD) methods have been extensively used in the semiconductor industries for bulk crystal growth, thin film deposition, and nanomaterials synthesis. In this article, we focus on the microwave-excited surface
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a2acf9b4214a25e0c79b8062fb25f4a
https://doi.org/10.3390/appliedchem2030012
https://doi.org/10.3390/appliedchem2030012
Publikováno v:
RSC Advances. 12:20610-20617
Microwave plasma chemical vapor deposition is a well-known method for low-temperature, large-area direct graphene growth on any insulating substrate without any catalysts. However, the quality has not been significantly better than other graphene syn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3bfed59386d6bfb9288cc6c8b2e98edf
https://doi.org/10.1039/d2ra03274k
https://doi.org/10.1039/d2ra03274k
Autor:
Takashi Egawa, Masayoshi Umeno
Publikováno v:
III-V Nitride Semiconductors ISBN: 9780367813628
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f3d9986bbe73493907763f47c388183
https://doi.org/10.1201/9780367813628-8
https://doi.org/10.1201/9780367813628-8
Publikováno v:
2022 12th International Congress on Advanced Applied Informatics (IIAI-AAI).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ede51d6f310f672ef8ce49ffc14d09f
https://doi.org/10.1109/iiaiaai55812.2022.00082
https://doi.org/10.1109/iiaiaai55812.2022.00082
Publikováno v:
Journal of Materials Science and Chemical Engineering. :1-9
Graphene thin films synthesized directly at low temperature (550˚C) on silicon substrate by microwave (MW) surface wave plasma (SWP) chemical vapor deposition (CVD) using the cover on substrates for avoiding plasma emission ultraviolet ray’s effec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17affe0aa7c9a459c281889651bb2785
https://doi.org/10.4236/msce.2021.910001
https://doi.org/10.4236/msce.2021.910001
Publikováno v:
International Journal of Smart Computing and Artificial Intelligence. 7:1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54d32524647e23e5eb4410be9a727910
https://doi.org/10.52731/ijscai.v7.i1.705
https://doi.org/10.52731/ijscai.v7.i1.705